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High Resistivity AlGaAs Grown by Low Temperature MBE

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EN
Al_{0.3}Ga_{0.7}As layers were grown by molecular beam epitaxy using substrate temperature 200-300°C, tetrameric As and two values of As/Ga+Al flux ratio i.e. 3 or 8. The post-growth annealing was performed in situ at 600°C for 20 min under As-overpressure. The samples were characterised by reflection high-energy electron diffraction, transmission electron microscope and room-temperature I-V measurements of n^{+}/LT grown layer /n^{+} resistors. The resistivity and trap-filled limited voltage have been determined. The best layers exhibited ρ of the order of 10^{9} Ω cm, were monocrystalline, uniformly precipitated and without dislocations.
EN
Analytical expressions of profiles of absorption and instantaneous fluorescence spectra of dye molecules in polar solvents are given. It is shown what parameters can be gained from electronic spectra of dye solutions. The new procedure of interpretation of transient fluorescence spectra is demonstrated in the case of the spectra of nile blue in alcohol.
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