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Surface Self-Diffusion of Iridium: Field Electron Emission Study

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Antczak G., Błaszczyszyn M., Błaszczyszyn R.
Acta Physica Polonica A
|
2000
|
vol. 98
|
issue 4
383-388
EN
The self-diffusion of iridium was studied by means of field electron microscopy. The measurements, based on the well-known process of surface build-up, were carried out under the UHV conditions within the temperature range of 790-935K. The activation energy for the diffusion was determined to be equal to 2.10±0.10eV/atom (48.4±2.3kcal/mol). This value is compared with activation energies for self-diffusion on other metal surfaces, as well as with those for self-diffusion of single iridium atoms and clusters on iridium, known from the field ion microscopy measurements.
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