Search results

Sort By:

Limit search:

Magnetoresistance in n-Si/SiO_2/Ni Nanostructures Manufactured by Swift Heavy Ion-Induced Modification Technology

100%

Fedotova J., Ivanou D., Ivanova Y., Fedotov A., Mazanik A., Svito I., Streltsov E., Saad A., Tyutyunnikov S., Kołtunowicz T., Demyanov S., Fedotova V.

Acta Physica Polonica A

2011

vol. 120

issue 1

133-135

A study of magnetotransport in the n-Si/SiO_2/Ni nanostructures with granular Ni nanorods in SiO_2 pores was performed over the temperature range 2-300 K and at the magnetic fields induction up to 8 T. The n-Si/SiO_2/Ni Schottky nanostructures display the enhanced magnetoresistive effect at 25 K due to the impurity avalanche mechanism.

Refine search results

1 Acta Physica Polonica A

1 2011

1 Demyanov S.

1 Fedotov A.

1 Fedotova J.

1 Fedotova V.

1 Ivanou D.

1 Ivanova Y.

1 Kołtunowicz T.

1 Mazanik A.

1 Saad A.

1 Streltsov E.

1 Svito I.

1 Tyutyunnikov S.

Search results

Magnetoresistance in n-Si/SiO_2/Ni Nanostructures Manufactured by Swift Heavy Ion-Induced Modification Technology