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Study of diamond film nucleation by ultrasonic seeding in different solutions

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Varga M., Ižák T., Kromka A., Veselý M., Hruška K., Michalka M.
Open Physics
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2012
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vol. 10
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issue 1
218-224
EN
In this study we have investigated diamond nucleation on Si substrates by ultrasonic seeding with different liquid solutions of Ultradispersed Detonation Diamond (UDD) powder in a mixture of metal nano- or microparticles (Ni, Co, Y). The influence of different solutions on nucleation efficiency was investigated. For highlighting nucleation centers and better evaluation of the nucleation process the nucleated samples were moved into a Microwave Plasma Enhanced Chemical Vapor Deposition (MW CVD) reactor and a ”short-time” (10 min), then followed by a ”long-time” (+1 hour), diamond deposition was performed. The morphology of samples was characterized by Scanning Electron Microscopy (SEM) and the chemical composition of grown diamond layer was investigated by Raman Spectroscopy. From the measurements we found out that microsized metal particles positively influenced nucleation and the uniformity of the deposited diamond thin film. The lowest surface roughness was achieved in the case of nanodiamond powder mixed with Co and Y metal powder. The influence of Ni, Co and Y to the nucleation and early growth stage are discussed.
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Erratum to “Study of diamond film nucleation by ultrasonic seeding in different solutions” by Marián Varga, Tibor Ižák, Alexander Kromka, Marian Veselý, Karel Hruška and Miroslav Michalka

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Varga M., Ižák T., Kromka A., Veselý M., Hruška K., Michalka M.
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