Micro- and Nanoprocessing of Polymers Using a Laser Plasma Extreme Ultraviolet Source

• Authors: A. Bartnik , H. Fiedorowicz , R. Jarocki , J. Kostecki , R. Rakowski , A. Szczurek , M. Szczurek
• Languages of publication: EN

Abstracts

EN

Laser plasma with temperature of the order of tens eV can be an efficient source of extreme ultraviolet (EUV). The radiation can be focused using different kind of optics, giving sufficient fluence for some applications. In this work we present results of investigations concerning applications of a laser plasma EUV source based on a double stream gas puff target. The source was equipped with two different grazing incidence collectors. One of them was a multifoil collector, the second one was an axisymmetrical ellipsoidal collector. The multifoil mirror was used mainly in experiments concerning micromachining of organic polymers by direct photo-etching. The experiments were performed for different polymers that were irradiated through a fine metal grid as a contact mask. The smallest element of a pattern structure obtained in this way was 5 μm, while the structure height was 50 μm giving an aspect ratio about 10. The laser-plasma EUV source equipped with the axisymmetrical ellipsoidal collector was used for surface modification of organic polymers and inorganic solids. The surface morphology after irradiation was investigated. Different forms of micro- and nanostructures were obtained depending on material and irradiation conditions.

Keywords

EN

52.38.Ph; 82.50.Kx; 81.40.Wx

Discipline

• 82.50.Kx: Processes caused by X-rays or γ-rays
• 81.40.Wx: Radiation treatment (particle and electromagnetic)(see also 61.80.-x Physical radiation effects, radiation damage)
• 52.38.Ph: X-ray, γ-ray, and particle generation

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2010
• Volume: 117
• Issue: 2
• Pages: 384-390

Dates

published

2010-02

Contributors

author

A. Bartnik

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

H. Fiedorowicz

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

R. Jarocki

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

J. Kostecki

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

R. Rakowski

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

A. Szczurek

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

author

M. Szczurek

• Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland

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Identifiers

DOI

10.12693/APhysPolA.117.384