High Power UV and VUV Excilamps and Their Applications

• Authors: V. Tarasenko , S. Avdeev , M. Erofeev , M. Lomaev , E. Sosnin , V. Skakun , D. Shitz
• Languages of publication: EN

Abstracts

EN

In the present paper, the review of the basic results obtained at the Laboratory of Optical Radiation at High Current Electronics Institute SB RAS during 2007-2009 years is presented. Efficient radiation of Ar_{2}, Kr_{2}, Xe_{2}, KrBr*, KrCl*, XeI*, XeBr*, XeCl*, Cl_{2}* molecules and I atoms was obtained in rare gas or in rare gas-Br_{2} (Cl_{2}, I_{2}) mixtures. Study of radiation parameters and lifetime period of the manufactured barrier discharge excilamps has been performed.

Keywords

EN

52.80.Tn; 42.72.Bj; 32.30.Jc

Discipline

• 52.80.Tn: Other gas discharges
• 32.30.Jc: Visible and ultraviolet spectra
• 42.72.Bj: Visible and ultraviolet sources

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2009
• Volume: 116
• Issue: 4
• Pages: 576-578

Dates

published

2009-10

Contributors

author

V. Tarasenko

• High Current Electronics Institute, Tomsk, Russia

author

S. Avdeev

• High Current Electronics Institute, Tomsk, Russia

author

M. Erofeev

• High Current Electronics Institute, Tomsk, Russia

author

M. Lomaev

• High Current Electronics Institute, Tomsk, Russia

author

E. Sosnin

• High Current Electronics Institute, Tomsk, Russia

author

V. Skakun

• High Current Electronics Institute, Tomsk, Russia

author

D. Shitz

• High Current Electronics Institute, Tomsk, Russia

References

• 1. B. Eliasson, U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 309 (1991)
• 2. I. Boyd, J. Zhang, Nuclear Instrum. Methods Phys. Res. B 121, 349 (1997)
• 3. I. Boyd, J. Zhang, U. Kogelshatz, in: Photo-Excited Processes, Diagnostics and Applications, Ed. A. Peled, Kluwer Academic, The Netherlands 2003, p. 161
• 4. M. Lomaev, V.S. Skakun, E.A. Sosmin, V.F. Tarasenko, D.V. Shitts, M.V. Erofeev, Physics-Usp. 46, 193 (2003)
• 5. R. Carman, R. Mildren, J. Phys. D, Appl. Phys. 36, 19 (2003)
• 6. U. Kogelschatz, Proc. SPIE 5483, 272 (2004)
• 7. M. Lomaev, E.A. Sosmin, V.F. Tarasenko, D.V. Shits, V.S. Skakun, M.V. Erofeev, A.A. Lisenko, Instrum. Exp. Techn. 49, 595 (2006)
• 8. K. Becker, and K. Schoenbach, in: Low Temperature Plasma. Fundamentals, Technologies, and Techniques, 2nd ed. Ed. R. Hippler, H. Kersten, M. Schmidt, K.H. Schoenbach, Wiley-VCH Verlag, Weinheim 2, 2008, p. 463

Identifiers

DOI

10.12693/APhysPolA.116.576