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2009 | 115 | 3 | 755-757

Article title

The Influence of Reactive Gaseous Flow Rate and Composition on the Optical Properties of TiO_2 Thin Films Deposited by Dc Magnetron

Content

Title variants

Languages of publication

EN

Abstracts

EN
In the paper there are shown the changes in optical properties of TiO_2 thin films prepared by dc magnetron sputtering at different gas flow rates. We found that there is a drastic change in optical properties such as optical transmission, refractive index, extinction coefficient and optical band gap with the gaseous flow rate and composition. We observed an improvement in optical properties of the films that had been deposited at higher gaseous flow rate and at a certain gaseous composition.

Keywords

EN

Year

Volume

115

Issue

3

Pages

755-757

Physical description

Dates

published
2009-03
received
2007-11-02
(unknown)
2008-02-20

Contributors

author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania
author
  • Physics Engineering and Environmental Engineering Dept., Bacau University Calea, Marasesti no. 157, Bacau, RO-600115, Romania

References

  • 1. S. Zhang, Y.F. Zhu, D.E. Brodie, Thin Solid Films. 213, 265 (1992)
  • 2. E. Kusano, J. Appl. Phys.. 70, 7089 (1991)
  • 3. M. Strome, A. Gutara, G.A. Niklasson, C.G. Granqvist, J. Appl. Phys.. 79, 3751 (1996)
  • 4. V. Dimitrov, S. Sakka, J. Appl. Phys.. 79, 1741 (1996)
  • 5. L. Foncioso, D.S. Presicce, M. Epifoni, P. Siciliano, A. Ficarella, Sensors Actuators B. 107, 563 (2005)
  • 6. A. Fujishima, T.N. Rao, D.A. Tryk, J. Photochem. Photobiol. C. 1, 1 (2000)
  • 7. M.K. Choi, Mater. Sci. Eng. B. 137, 138 (2007)
  • 8. V. Dimitrov, S. Sakka, J. Appl. Phys.. 79, 1741 (1996)
  • 9. R. Konenkamp, P. Hoyer, A. Wahl, J. Appl. Phys.. 79, 7029 (1996)
  • 10. K.A. Vorotilov, E.V. Orlova, V.I. Petrovsky, Thin Solid Films 207, 180 (1992)
  • 11. W.G. Lee, S.I. Woo, J.C. Kim, S.H. Choi, K.H. Oh, Thin Solid Films 237, 105 (1994)
  • 12. M. Stamate, Appl. Surf. Sci. 205, 323 (2003)
  • 13. R. Swanpoel, J. Phys. E, Sci. Instrum. 16, 1214 (1983)

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv115n328kz
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