The Surface Hydro-Oxidation of LaNiO_{3-x} Thin Films

• Authors: S. Mickevičius , S. Grebinskij , V. Bondarenka , V. Lisauskas , K. Šliužienė , H. Tvardauskas , B. Vengalis , B. Orłowski , V. Osinniy , W. Drube
• Languages of publication: EN

Abstracts

EN

The high-energy X-ray photoelectron spectroscopy was used to determine the composition and chemical structure of epitaxial LaNiO_{3-x} films obtained by a reactive dc magnetron sputtering. It was found that the oxide and hydroxide species of La and Ni are on the films surface. The thickness of hydroxide enriched layer, estimated from the oxide and hydroxide peak intensities, is about 2 nm.

Keywords

EN

79.60.-i; 71.20.Nr; 29.20.Lq

Discipline

• 79.60.-i: Photoemission and photoelectron spectra(for photoelectron spectroscopy, see 87.64.ks in biological physics; 82.80.Pv in chemical analysis)
• 71.20.Nr: Semiconductor compounds

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2007
• Volume: 112
• Issue: 1
• Pages: 113-120

Dates

published

2007-07

received

2007-07-03

Contributors

author

S. Mickevičius

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

S. Grebinskij

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

V. Bondarenka

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

V. Lisauskas

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

K. Šliužienė

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

H. Tvardauskas

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

B. Vengalis

• Semiconductor Physics Institute, A. Gostauto 11, 01108 Vilnius, Lithuania

author

B. Orłowski

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

V. Osinniy

• Institute of Physics, Polish Academy of Sciences, al. Lotników 32/46, 02-668 Warsaw, Poland

author

W. Drube

• Hamburger Synchrotronstrahlungslabor HASYLAB, am Deutschen Elektronen-Synchrotron DESY, Notkestr. 85, 22603 Hamburg, Germany

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Identifiers

DOI

10.12693/APhysPolA.112.113