Study of Tip-Induced Ti-Film Oxidation in Atomic Force Microscopy Contact and Non-Contact Mode

• Authors: J. Šoltýs , V. Cambel , J. Fedor
• Languages of publication: EN

Abstracts

EN

Local anodic oxidation of metals using scanning probe techniques is mostly used for fabrication of isolated gates. The high-resistance oxide created in such a manner divides a thin metallic film into isolated regions. The tip-induced metallic oxide has not so far been used in nanolithography processes as a masking material. The aim of this contribution is to study the technological potential of a TiO_x mask prepared by the local anodic oxidation of a Ti film. Such a mask can be used to complete a nanotechnology process using atomic force microscopy, which can be easily combined with standard optical lithography techniques. We have found that the insulating properties of the oxides prepared in contact and non-contact modes differ strongly - they represent an energy barrier of 200 meV and 400 meV, respectively.

Keywords

EN

07.79.Lh; 81.16.Nd

Discipline

• 07.79.Lh: Atomic force microscopes
• 81.16.Nd: Micro- and nanolithography

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2003
• Volume: 103
• Issue: 6
• Pages: 553-558

Dates

published

2003-06

received

2003-05-30

Contributors

author

J. Šoltýs

• Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava, Slovakia

author

V. Cambel

• Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava, Slovakia

author

J. Fedor

• Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava, Slovakia

References

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Identifiers

DOI

10.12693/APhysPolA.103.553