Investigations of Third-Harmonic Generation in Xenon by Means of a TOF Mass Spectrometer

• Authors: L. Michalak , R. Steenvoorden
• Languages of publication: EN

Abstracts

EN

TOF mass spectrometer for research of third-harmonic generation effect in isotropic media was used. The nonlinear medium in the experiment was Xe gas, the incident beam had the wavelength of 3546 Ǻ and the generated radiation had the wavelength of 1182 Ǻ. A measure for the intensity of generated VUV was the intensity of the ion current generated at the spot where a non-homogeneous effusive molecular (2,2-dimethylbutane) beam was crossed by the VUV beam. The influence of parameters like the diameter of the UV beam and the Xe pressure on the VUV generation process was examined. The third-larmonic generation theory was used to verify the mass spectrometric data.

Keywords

EN

42.65.Ky; 07.75.+h

Discipline

• 07.75.+h: Mass spectrometers(see also 82.80.Ms, 82.80.Nj, and 82.80.Rt in physical chemistry and chemical physics)
• 42.65.Ky: Frequency conversion; harmonic generation, including higher-order harmonic generation(see also 42.79.Nv Optical frequency converters)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1991
• Volume: 79
• Issue: 5
• Pages: 661-670

Dates

published

1991-05

received

1990-09-14

(unknown)

1991-05-10

Contributors

author

L. Michalak

• Institute of Physics, Maria Curie-Skłodowska University pl. Marii Curie-Skłodowskiej 1, 20-031 Lublin, Poland

author

R. Steenvoorden

• FOM Institute for Atomic and Molecular Physics, Kruislaan 407, 1098 SJ Amsterdam, The Netherlands

Identifiers

DOI

10.12693/APhysPolA.79.661