Manufacturing of thin nickel-rich alloy films on powder substrate using magnetron sputtering technique

• Authors: Klaudia Bordolińska
• Languages of publication: EN

Abstracts

EN

The magnetron sputtering technology has been applied to obtain five kinds of thin, nickel-rich layers on tungsten powder substrate. Circular plates (30 mm in diameter) of pure nickel (99.9%), inconel 600 (72% Ni, 17% Cr, 10% Fe), inconel 601 (63% Ni, 25% Cr, 7.6% Fe), inconel c-276 (51% Ni, 16.5% Cr, 17% Mo) and incoloy H / HT (35% Ni, 23% Cr, 39.5% Fe) were used as sputtering targets. The nickel-based layers have been deposited on pure tungsten powder (2 g; fraction 20-50 µm). After 2 hours of sputtering, the produced layers have been dissolved in 2M HCl solution. The obtained solutions were then analyzed on Ni2+, Cr3+, Fe2+ or Mo2+ ions. The analysis data allows for evaluation of the thickness of the obtained coatings.

Keywords

EN

ICP analysis; layer thickness; magnetron sputtering; thin layers

Discipline

• CHEMISTRY: CHEMISTRY

• Journal: World Scientific News
• Year: 2017
• Volume: 76
• Pages: 16-22

Contributors

author

Klaudia Bordolińska

• Department of Chemistry, Faculty of Production Engineering and Materials Technology, Czestochowa University of Technology, 19 Al. Armii Krajowej, 42-200 Czestochowa, Poland

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• Document Type: article