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2017 | 72 | 248-255
Article title

The Zno Nano Material Interaction With Nd:YAG Laser Under Vacuum

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EN
Abstracts
EN
The goal of this paper is to study the Nd:YAG laser interaction with the ZnO nanomaterial by etching the ZnO nanodisc surface. The preparation of ZnO nanodisc is studied also and the setup which we use in previous experiment published in the (IJRRR, Vol. X, Issue 1, March 2017) is used also. The interaction is done under vacuum conditions with high pressure in the range of (10-3) Tor. The main target of the paper is to study the plasma generated from the etching of the ZnO nanodisc by Nd:YAG laser.
Discipline
Year
Volume
72
Pages
248-255
Physical description
Contributors
  • Department of Communication, Engineering Technical Collage of Najaf, Al-Furat Al Awset Technical University, Najaf, Iraq
  • Department of Physics, Collage of Sciences, University of Mosul, Mosul, Iraq
References
  • [1] Edward G. Gibson, Atmospheric Plasma Materials Processing for Energy Applications, The Leverhulme Trust, Copyright © 2014.
  • [2] Michael A. Lieberman and et.al. Principles of Plasma discharge and materials processing, Second edition, A John Wiley and Sons, INC publication, © 2005 published simultaneously in CANDA.
  • [3] S. Trusso, E. Barletta and et.al., Time resolved imaging studies of the plasma produced by laser ablation of silicon in O20Ar atmosphere, Laser and Particle Beams~2005, 23, 149-153. Printed in the USA. Copyright © 2005 Cambridge University Press.
  • [4] Junhong Chen, Ganhua Lu, Liying Zhu, Richard C. Flagan. A simple and versatile mini-arc plasma source for nanocrystal synthesis. Journal of Nanoparticle Research 9(2) (2017) 203-213
  • [5] Dorothée Vinga Szabó and Sabine Schlabach. Microwave Plasma Synthesis of Materials—From Physics and Chemistry to Nanoparticles: A Materials Scientist’s Viewpoint. Inorganics 2 (2014) 468-507
  • [6] A. Di Piazza, C. M¨uller, and et.al. Extremely high-intensity laser interactions with fundamental quantum systems, Max-Planck- Institut fur Kernphysik, Saupfercheckweg, (Aplril 26, 2012).
  • [7] Fornaca, S.W et.al. Laser-produced plasma light source for extreme ultraviolet lithography. Proceedings of IEEE volume 90, Issue 10, pp. 1689-1695, Oct. 2002
  • [8] Richard Fitzpatrick, Plasma physics, Professor of physics, The University of Texas at Austin. 2006, pp. 6-8.
  • [9] Wolfgang Baumjohann and et.al., Basic space plasma physics, Max-Planck institute für extraterrestriche physics, Garching, institute für Geophysics, Ludwig – Maximilians – University, München, Germany. 2006.
  • [10] Prof. F.F. Chen, Principles of Plasma Processing, Electrical Engineering Department, University of California, Los Angeles. Plenum/Kluwer publishers, 2012.
Document Type
article
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Identifiers
YADDA identifier
bwmeta1.element.psjd-6f8d17ec-ad49-4e9f-91c5-1539c4d6909e
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