Preferences help
enabled [disable] Abstract
Number of results
2017 | 76 | 60-65
Article title

The kinetics of growth of high entropy alloy layers sputtered on Tungsten powder substrate

Title variants
Languages of publication
Tungsten powder particles have been encapsulated with thin CrMnFeCoNi layers by magnetron sputtering method using high entropy alloy as a target. In the course of sputtering the powder surface has been periodically analyzed. The multimetallic coatings were being dissolved in 2 M HCl and the obtained solutions were analyzed by ICP method to determine Cr3+, Mn2+, Fe2+, Co2+ and Ni2+ ions concentration. The aim of the analysis was comparison of atomic proportions of the elements in the target and in obtained layer and indirect determining of the layer thickness.
Physical description
  • Department of Chemistry, Faculty of Production Engineering and Materials Technology, Czestochowa University of Technology, Czestochowa, Poland
  • [1] L. A. Dobrzański, International COSCO. World Press, Gliwice 2009.
  • [2] D. M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing (2010). eBook ISBN:9780815520382
  • [3] P. J. Kelly, R.D. Arnell. Vacuum 56(3) (2000) 159-172
  • [4] A. Stefaniak, Rozdział w monografii: Wyzwania Naukowców we Współczesnym Świecie OMNIBUS 08 (2015) 68-73
  • [5] K. Bordolińska, A. Stefaniak, H. Bala, Ochr. przed Koroz. 59 (2016) 43-45
  • [6] A. S. Kashin, V. P. Ananikov, Russian Chemical Bulletin, International Edition 60 (2011) 2602-2607
  • [7] Y. Xiaozheng, S. Zhigang, Powder Technology 187 (2008) 239-243
  • [8] L. Zhang, L. Q. Shi, Z. J. He, B. Zhang, Y. F. Lu, A. Liu, B. Y. Wang, Surface and Coating Technology 203 (2009) 3356-3360
  • [9] B. S. Murty, J. W. Yeh, S. Ranganathan. High entropy alloys Elsevier Inc. (2014)
  • [10] M. H. Tsai J-W. Yeh. Materials Research Letters 2 (2014) 107-123
  • [11] D. B. Miracle, Material Science and Technology 31 (2015) 1142-1147
  • [12] Y. Zhang, J-W. Qiao, P. K. Liaw, Journal of Iron and Steel Research, International 23 (2016) 2-6
  • [13] I. R. Shanginyan, V. F. Gorban, N. A. Krapivka, S. A. Firstov, I. F. Kopylov, Journal of Superhard Materials 38 (2016) 25-33
  • [14] V. F. Gorban, R. A. Shaginyan, N. A. Krapivka, S. A. Firstov. N. I. Danilenko, I. V. Serdyuk, Powder Metallurgy and Metal Ceramics 54 (2016) 752-730
  • [15] S. Zhang, C. L. Wu, C. H. Zhang, M. Guan, J. Z. Tan. Optics and Laser Technology 84 (2016) 23-31
  • [16] X. W. Qiu, Y. P. Zhang, C. G. Liu, Journal of Alloys and Compounds 585 (2014) 282-286
  • [17] J. Dora, Zasilacz rezonansowy. Patent PL nr 313150, Urząd Patentowy RP (1996)
  • [18] K. Bordolińska, A. Stefaniak, P. Pawlik, Hutnik 82 (2015) 666-669
Document Type
Publication order reference
YADDA identifier
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.