Zinc Oxide by Atomic Layer Deposition for the second and third generation of photovoltaic cells

• Authors: Marek Godlewski , Grzegorz Łuka , Krzysztof Kopalko , Elżbieta Guziewicz
• Languages of publication: EN

Abstracts

EN

ZnO films deposited by Atomic Layer Deposition (ALD) method at different growth conditions have required electron concentrations and electron mobilities for applications as n-type partners to ptype CdTe (ZnO layers with a reduced free electron concentration) and the transparent conductive oxide (TCO, metallic ZnO films). In the latter case their electrical properties are comparable to those of ITO and ZnO:Al (AZO) films obtained by a sputtering. We also demonstrate that ZnO films deposited by the ALD are suitable for construction of hybrid structures (semiconductor/organic material) for applications in novel photovoltaic (PV) panels based on organic materials (PV cells of the third generation).

Discipline

• ENERGETICS: ENERGETICS

• Publisher: Polskie Stowarzyszenie Wodoru i Ogniw Paliwowych
• Journal: Biuletyn Polskiego Stowarzyszenia Wodoru i Ogniw Paliwowych
• Year: 2011
• Issue: 6
• Pages: 8-11

Contributors

author

Marek Godlewski

• Dept. Math. and Natural Sciences College of Science, Cardinal S. Wyszyński Univ., Warsaw, Poland

author

Grzegorz Łuka

• Institute of Physics, Polish Acad. Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

author

Krzysztof Kopalko

• Institute of Physics, Polish Acad. Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

author

Elżbieta Guziewicz

• Institute of Physics, Polish Acad. Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland

References

• 2007 Survey of Energy Resources World Energy Council 2007
• E. Katsia, N. Huby, G. Tallarida, B. Kutrzeba-Kotowska, M. Perego, S. Ferrari, F. C. Krebs, E. Guziewicz, M. Godlewski, G. Łuka, Appl. Phys. Lett. 94, 2009, p. 143501.
• R. McConnell, Semiconductors 38, 2004, p. 931.
• A. Bosio, N. Romeo, S. Mazzamuto, V. Canevari, Progress in Crystal Growth and Characterization of Materials 52, 2006, p. 247.
• J.A. Aranovich, D. Golmayo, A.L. Fahrenbruch, R.H. Bube, J. Appl. Phys. 51, 1980, p. 4260.
• N. Huby, S. Ferrari, E. Guziewicz, M. Godlewski, V.Osinniy, Appl. Phys. Lett. Vol. 92, 2008, p.023502.
• E. Guziewicz, I.A. Kowalik, M. Godlewski, K. Kopalko,V. Osinniy, A. Wójcik, S. Yatsunenko, E. Łusakowska,W. Paszkowicz,, J. Appl. Phys. 103,2008, p. 033515.
• 8. K. Kopalko, M. Godlewski, J.Z. Domagala, E. Lusakowska,R. Minikayev, W. Paszkowicz, A. Szczerbakow, Chemistry of Materials 16, 2004, p.1447.
• A. Wójcik, M. Godlewski, E. Guziewicz, R. Minikayev, W. Paszkowicz, J. Cryst. Growth 310, 2008, p. 284.
• T. Krajewski, E. Guziewicz, M. Godlewski, Ł. Wachnicki, I.A. Kowalik, K. Kopalko, A. Wójcik, V.Osinniy, M. Guziewicz, Microelectron. J. 40, 2009, p. 293.
• M. Godlewski, E. Guziewicz, G. Łuka, T. Krajewski, M. Łukasiewicz, Ł. Wachnicki, A. Wachnicka, K.Kopalko, A. Sarem, B. Dalati, Thin Solid Films 518, 2009, p. 1145.
• B. Späth, J. Fritsche, F. Säuberlich, A. Klein, W.Jaegermann, Thin Solid Films 480-481, 2005, p.204.
• O. Bamiduro, H. Mustafa, R. Mundle, R.B. Konda, A.K. Pradhan, Appl. Phys. Lett. 90, 2007, p.252108.
• T. Strachowski, W. Lojkowski, E. Grzanka, A. Presz, J. D. Fidelus, M. Godlewski, S. Yatsunenko, H.Matysiak, R.R. Piticescu, C.J. Monty, J. Appl. Phys. 102, 2007, p. 075513.
• K. Ellmer and R. Mientus, Thin Solid Films Vol. 516, 2008, p. 5829.
• M. Godlewski, E. Guziewicz, T. Krajewski, P.Kruszewski, Ł. Wachnicki, K. Kopalko, A. Wójcik, V. Osinniy, Microelectronic Engineering 85, 2008, p. 2434.
• See F.C. Krebs, in Degradation and Stability of Polymer and Organic Solar Cells ed. F.C. Krebs Solar Energy Materials & Solar Cells 92, 2008, p. 685.

• Document Type: article