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PN-ISO 690:2012
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Chicago (Author-Date)
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Journal
Bulletin of the Polish Academy of Sciences: Technical Sciences
2006
|
54
|
4
|
Article title
Distribution of potential barrier height local values at Al-SiO2 and Si-SiO2 interfaces of the metal-oxide-semiconductor structures
Authors
K. Piskorski
,
H.M. Przewlocki
Content
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Languages of publication
PL
Abstracts
Keywords
PL
barrier height
effective contact potential difference
MOS system
Nauki Techniczne
Publisher
Polska Akademia Nauk
Journal
Bulletin of the Polish Academy of Sciences: Technical Sciences
Year
2006
Volume
54
Issue
4
Physical description
Contributors
author
K. Piskorski
author
H.M. Przewlocki
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.oai-journals-pan-pl-111741
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