Surfaces of Electron-Emitting Glasses Studied by a Slow Positron Beam

• Authors: D. Pliszka , M. Gazda , B. Kusz , K. Trzebiatowski , G. Karwasz , W. Deng , R. Brusa , A. Zecca
• Languages of publication: EN

Abstracts

EN

Semi-conducting glasses used for electron multipliers and microchannel plate devices are obtained by surface modification of Pb or Bi-reach silicon-based glasses. The reduced layer extends down to 200-500 nm, much more than the effective depth of the electron-emitting layer. By the use of slow-positron beam we monitor the structural changes undergoing in near-to-surface layers after isothermal annealing. The measurements suggest a possible correlation between secondary-electron emission coefficient and the Doppler-broadening S-parameter. On these samples there were also performed atomic force microscopy, secondary electron emission, differential scanning calorimetry, and electric conductivity measurements.

Keywords

EN

71.60.+z; 78.70.Bj

Discipline

• 78.70.Bj: Positron annihilation(for positron states, see 71.60.+z in electronic structure of bulk materials; for positronium chemistry, see 82.30.Gg in physical chemistry and chemical physics)
• 71.60.+z: Positron states(for positron annihilation, see 78.70.Bj)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2001
• Volume: 99
• Issue: 3-4
• Pages: 465-472

Dates

published

2001-03/04

received

2000-09-18

Contributors

author

D. Pliszka

• Institute of Physics, Pedagogical University, Arciszewskiego 22B, 76-200 Słupsk, Poland

author

M. Gazda

• Faculty of Technical Physics and Applied Mathematics, Technical University, Narutowicza 11/12, 80-952 Gdańsk, Poland

author

B. Kusz

• Faculty of Technical Physics and Applied Mathematics, Technical University, Narutowicza 11/12, 80-952 Gdańsk, Poland

author

K. Trzebiatowski

• Faculty of Technical Physics and Applied Mathematics, Technical University, Narutowicza 11/12, 80-952 Gdańsk, Poland

author

G. Karwasz

• Istituto Nazionale per la Fisica della Materia, Unita' di Trento, 38-050 Povo, Italy

author

W. Deng

• Istituto Nazionale per la Fisica della Materia, Unita' di Trento, 38-050 Povo, Italy

author

R. Brusa

• Istituto Nazionale per la Fisica della Materia, Unita' di Trento, 38-050 Povo, Italy

author

A. Zecca

• Istituto Nazionale per la Fisica della Materia, Unita' di Trento, 38-050 Povo, Italy

References

• 1. A.M. Then, C.G. Pantano, J. Non-Cryst. Solids, 120, 178, 1990
• 2. K. Trzebiatowski, A. Witkowska, M. Chybicki, Polish Ceramic Bulletin, 19, 157, 1998
• 3. A. Zecca, M. Bettonte, J. Paridaens, G.P. Karwasz, R.S. Brusa, Meas. Sci. Technol., 9, 409, 1998
• 4. R.S. Brusa, G.P. Karwasz, N. Tiengo, A. Zecca, F. Corni, G. Ottaviani, R. Tonini, Phys. Rev. B, 61, 10154, 2000
• 5. P. Ashoka-Kumar, K.G. Lynn, D.O. Welch, J. Appl. Phys., 76, 4935, 1994

Identifiers

DOI

10.12693/APhysPolA.99.465