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2000 | 98 | 5 | 483-494
Article title

X-Ray Resonant Magnetic Scattering: Application to Thin Films and Multilayers

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EN
Abstracts
EN
This paper reports on the use of a new technique to investigate the magnetic properties of thin films, multilayers and artificial structures, the X-ray resonant magnetic scattering at small values of the scattering vector. It can be used either by registering the reflectivity pattern or in a diffraction mode. In comparison with magneto-optical Kerr effect or neutron scattering, it offers an atomic selectivity due to the resonant excitation of a core electron, and even an electronic shell one. Examples are presented mainly in the soft X-range allowing to probe the 3d band of transition metals. They demonstrate the promising possibilities of the method to measure the magnetic moments carried by each of the atomic components in complex systems, as well as their distribution through thin layers, with an atomic resolution.
Keywords
EN
Publisher

Year
Volume
98
Issue
5
Pages
483-494
Physical description
Dates
published
2000-11
Contributors
author
  • Laboratoire de Cristallographie, CNRS and UJF B.P. 166, 38042 Grenoble Cedex 09, France
author
  • Laboratorio di Strutturistica Chimica, Universitá di Brescia Via Branze 38, 25123 Brescia, Italy
author
  • Laboratoire de Cristallographie, CNRS and UJF B.P. 166, 38042 Grenoble Cedex 09, France
author
  • Laboratorio di Strutturistica Chimica, Universitá di Brescia Via Branze 38, 25123 Brescia, Italy
References
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Publication order reference
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YADDA identifier
bwmeta1.element.bwnjournal-article-appv98z504kz
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