Surface Self-Diffusion of Iridium: Field Electron Emission Study

• Authors: G. Antczak , M. Błaszczyszyn , R. Błaszczyszyn
• Languages of publication: EN

Abstracts

EN

The self-diffusion of iridium was studied by means of field electron microscopy. The measurements, based on the well-known process of surface build-up, were carried out under the UHV conditions within the temperature range of 790-935K. The activation energy for the diffusion was determined to be equal to 2.10±0.10eV/atom (48.4±2.3kcal/mol). This value is compared with activation energies for self-diffusion on other metal surfaces, as well as with those for self-diffusion of single iridium atoms and clusters on iridium, known from the field ion microscopy measurements.

Keywords

EN

61.16.-d; 68.35.Fx; 68.90.+g; 68.55.-a

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2000
• Volume: 98
• Issue: 4
• Pages: 383-388

Dates

published

2000-10

received

2000-05-18

(unknown)

2000-07-17

Contributors

author

G. Antczak

• Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland

author

M. Błaszczyszyn

• Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland

author

R. Błaszczyszyn

• Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland