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2000 | 98 | 4 | 383-388
Article title

Surface Self-Diffusion of Iridium: Field Electron Emission Study

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EN
Abstracts
EN
The self-diffusion of iridium was studied by means of field electron microscopy. The measurements, based on the well-known process of surface build-up, were carried out under the UHV conditions within the temperature range of 790-935K. The activation energy for the diffusion was determined to be equal to 2.10±0.10eV/atom (48.4±2.3kcal/mol). This value is compared with activation energies for self-diffusion on other metal surfaces, as well as with those for self-diffusion of single iridium atoms and clusters on iridium, known from the field ion microscopy measurements.
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Publisher

Year
Volume
98
Issue
4
Pages
383-388
Physical description
Dates
published
2000-10
received
2000-05-18
(unknown)
2000-07-17
Contributors
author
  • Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland
  • Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland
  • Institute of Experimental Physics, University of Wrocław, Pl. M. Borna 9, 50-204 Wrocław, Poland
References
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Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv98z407kz
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