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Number of results
2000 | 97 | 3 | 539-542

Article title

Influence of Temperature and Annealing on GMR in Sputtered Permalloy/Cu Multilayers

Content

Title variants

Languages of publication

EN

Abstracts

EN
The influence of temperature and annealing on giant magnetoresistance of Si(100)/Cu(20 nm)/Py(2 nm)/(Cu(2 nm)/Py(2 nm))_{100} multilayer (Py = Ni_{83}Fe_{17}) sputtered at room temperature in double face-to-face configuration is reported. It was found that giant magnetoresistance value, ΔR_{GMR}/R_{sat} (where R_{sat} is the resistance in saturation), monotonically decreases with increasing temperature (4.5% at 173 K to about 1% at 373 K). This results from the decrease in magnetic change of resistance, ΔR_{GMR}, and to the lesser extent from an increase in R_{sat}, though both of them are caused by the shortening of electrons mean free path. The observed almost linear decrease in giant magnetoresistance saturation field with increasing temperature is explained by temperature changes of magnetization profile. Vibrating sample magnetometer measurements revealed that the increase in temperature results in pronounced decrease in remnant to saturation magnetization ratio (M_{r}/M_{s}) suggesting that at low temperatures magnetic bridges between Py layers play an important role in magnetization process. It is shown that proper annealing, by an annihilation of bridges and/or lateral decoupling, leads to an increase in giant magnetoresistance ratio from 3.4% in as deposited state to 4.7%.

Keywords

EN

Year

Volume

97

Issue

3

Pages

539-542

Physical description

Dates

published
2000-03

Contributors

author
  • Institute of Molecular Physics, Polish Academy of Sciences, Smoluchowskiego 17, 60-179 Poznań, Poland
author
  • Institute of Molecular Physics, Polish Academy of Sciences, Smoluchowskiego 17, 60-179 Poznań, Poland
author
  • Institute of Molecular Physics, Polish Academy of Sciences, Smoluchowskiego 17, 60-179 Poznań, Poland
author
  • Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warszawa, Poland
author
  • Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warszawa, Poland
author
  • Institute of Molecular Physics, Polish Academy of Sciences, Smoluchowskiego 17, 60-179 Poznań, Poland

References

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv97z344kz
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