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Number of results
1999 | 96 | 1 | 137-142

Article title

Structure Changes in Cz-Si Single Crystals Irradiated with Fast Oxygen and Neon Ions

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EN

Abstracts

EN
The research of the surface and the near-surface region of Cz-Si wafers irradiated with fast oxygen and neon ions of energy 4 MeV/u and dose 10^{14} particles/cm^{2} is presented. In our study several methods based on the Bragg case of X-ray diffraction using Ag K_{α_{1}}, as well as reflection high-energy electron diffraction and Nomarsky optical microscopy were used. It was shown that implantation with fast neon ions causes larger disturbances of silicon crystal structure than irradiation with oxygen ions.

Keywords

EN

Contributors

author
  • Institute for Physics of Semiconductors, National Academy of Sciences of Ukraine, 45, Nauki av., 252 650 Kiev, Ukraine
author
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, 02-668 Warsaw, Poland
author
  • Institute for Physics of Semiconductors, National Academy of Sciences of Ukraine, 45, Nauki av., 252 650 Kiev, Ukraine
author
  • Institute for Physics of Semiconductors, National Academy of Sciences of Ukraine, 45, Nauki av., 252 650 Kiev, Ukraine
author
  • Institute for Physics of Semiconductors, National Academy of Sciences of Ukraine, 45, Nauki av., 252 650 Kiev, Ukraine
author
  • Institute for Physics of Semiconductors, National Academy of Sciences of Ukraine, 45, Nauki av., 252 650 Kiev, Ukraine
author
  • Heavy Ion Laboratory, Warsaw University, Pasteura 5a, 02-093 Warsaw, Poland
author
  • Heavy Ion Laboratory, Warsaw University, Pasteura 5a, 02-093 Warsaw, Poland

References

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bwmeta1.element.bwnjournal-article-appv96z111kz
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