Magnetron Sputtered SnO_{x} Films on Tin Probed by Slow Positron Implantation Spectroscopy

• Authors: N. Nancheva , P. Docheva , W. Anwand , G. Brauer , P. Coleman
• Languages of publication: EN

Abstracts

EN

SnO_{x} films grown on tin substrates via d.c. magnetron sputtering at different bias were studied by slow positron implantation spectroscopy. The change of substrate bias from -40 V to -140 V and its influence on the films is shown and discussed.

Keywords

EN

78.70.-g

Discipline

• 78.70.-g: Interactions of particles and radiation with matter

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1999
• Volume: 95
• Issue: 4
• Pages: 623-626

Dates

published

1999-04

Contributors

author

N. Nancheva

• Department of Physics, Technical University, Rousse 7017, Bulgaria

author

P. Docheva

• Department of Physics, Technical University, Rousse 7017, Bulgaria

author

W. Anwand

• Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf Postfach 510119, 01314 Dresden, Germany

author

G. Brauer

• Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf Postfach 510119, 01314 Dresden, Germany

author

P. Coleman

• School of Physics, University of East Anglia, Norwich NR4 7TJ, UK

Identifiers

DOI

10.12693/APhysPolA.95.623