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1999 | 95 | 4 | 623-626
Article title

Magnetron Sputtered SnO_{x} Films on Tin Probed by Slow Positron Implantation Spectroscopy

Content
Title variants
Languages of publication
EN
Abstracts
EN
SnO_{x} films grown on tin substrates via d.c. magnetron sputtering at different bias were studied by slow positron implantation spectroscopy. The change of substrate bias from -40 V to -140 V and its influence on the films is shown and discussed.
Keywords
EN
Publisher

Year
Volume
95
Issue
4
Pages
623-626
Physical description
Dates
published
1999-04
Contributors
author
  • Department of Physics, Technical University, Rousse 7017, Bulgaria
author
  • Department of Physics, Technical University, Rousse 7017, Bulgaria
author
  • Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf Postfach 510119, 01314 Dresden, Germany
author
  • Institut fur Ionenstrahlphysik und Materialforschung, Forschungszentrum Rossendorf Postfach 510119, 01314 Dresden, Germany
author
  • School of Physics, University of East Anglia, Norwich NR4 7TJ, UK
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv95z431kz
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