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1998 | 94 | 3 | 427-430

Article title

Polarity Related Problems in Growth of GaN Homoepitaxial Layers

Content

Title variants

Languages of publication

EN

Abstracts

EN
Homoepitaxial layers of GaN were grown by metalorganic chemical vapour deposition on single crystals obtained by high-pressure, high-temperature technology. For each metalorganic chemical vapour deposition run, four samples were placed, (00.1) and (00.1̲) faces of the Mg-doped insulating and undoped highly-conductive substrates. The layers were examined using X-ray diffraction, photoluminescence and far-infrared reflectivity. It was found that the (00.1̲) easier incorporates donors resulting in higher free-electron concentrations in the layers grown on these sides of the crystals, both, undoped and Mg-doped.

Keywords

EN

Year

Volume

94

Issue

3

Pages

427-430

Physical description

Dates

published
1998-09

Contributors

  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
author
  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
author
  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
author
  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
author
  • High Pressure Research Center, Sokołowska 29/37, 01-142 Warsaw, Poland
  • Institute of Electronics Technology, Wrocław Technical University, Janiszewskiego 11/17, 50-372 Wrocław, Poland
author
  • Institute of Electronics Technology, Wrocław Technical University, Janiszewskiego 11/17, 50-372 Wrocław, Poland
author
  • CRHEA-CNRS, Sophia Antipolis, 06960-Valbonne, France
author
  • CRHEA-CNRS, Sophia Antipolis, 06960-Valbonne, France
author
  • Commissariat à l'Energie Atomique/Departement de Recherche Fondamentale sur la Matière Condensée, 38054 Grenoble, Cedex, France
author
  • Commissariat à l'Energie Atomique/Departement de Recherche Fondamentale sur la Matière Condensée, 38054 Grenoble, Cedex, France
author
  • Université de Montpellier II, Groupe d'Etudes des Semiconducteurs, Place E. Bataillon, 34095 Montpellier, France
author
  • Université de Montpellier II, Groupe d'Etudes des Semiconducteurs, Place E. Bataillon, 34095 Montpellier, France

References

Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv94z314kz
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