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1997 | 91 | 5 | 1025-1030
Article title

Comparative Studies of Surface Roughness of Thin Epitaxial Si Films by Computer Simulations and Experimental X-Ray and Optical Methods

Content
Title variants
Languages of publication
EN
Abstracts
EN
The paper presents investigations of the surface roughness of epitaxial silicon films obtained by chemical vapour deposition with chloric and MOCVD processes. The flat surfaces of films and chemically etched surfaces of substrates were studied by optical methods as well as by X-ray reflectivity at grazing incidence. The computer simulations based on Fresnel theory were compared with the experimental results.
Keywords
EN
Year
Volume
91
Issue
5
Pages
1025-1030
Physical description
Dates
published
1997-05
References
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv91z532kz
Identifiers
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