Scanning Force Microscopy on Laser Ablated Silicon Nitride Films

• Authors: C. Vrînceanu , C. Flueraru , M. Dinescu , E. Vasile
• Languages of publication: EN

Abstracts

EN

The following paper presents a study on laser-ablated silicon nitride films, obtained by the laser reactive ablation method. The aim of this paper is to investigate silicon nitride film surfaces, first by scanning electron microscopy and then, at a better resolution and a greater magnification, by the scanning (atomic) force microscopy technique.

Keywords

EN

61.16.Ch; 61.16.Bg; 68.55.Jk

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1997
• Volume: 91
• Issue: 5
• Pages: 1009-1014

Dates

published

1997-05

Contributors

author

C. Vrînceanu

• Institute of Microtechnology, P.O. Box 38-160, Bucharest 72225, Romania

author

C. Flueraru

• Institute of Microtechnology, P.O. Box 38-160, Bucharest 72225, Romania

author

M. Dinescu

• Institute of Atomic Physics, P.O. Box MG-6, Bucharest 76900, Romania

author

E. Vasile

• METAV S.A., Zapada Mieilor 16-18, Bucharest 71529, Romania