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1997 | 91 | 5 | 1009-1014
Article title

Scanning Force Microscopy on Laser Ablated Silicon Nitride Films

Content
Title variants
Languages of publication
EN
Abstracts
EN
The following paper presents a study on laser-ablated silicon nitride films, obtained by the laser reactive ablation method. The aim of this paper is to investigate silicon nitride film surfaces, first by scanning electron microscopy and then, at a better resolution and a greater magnification, by the scanning (atomic) force microscopy technique.
Keywords
EN
Publisher

Year
Volume
91
Issue
5
Pages
1009-1014
Physical description
Dates
published
1997-05
Contributors
author
  • Institute of Microtechnology, P.O. Box 38-160, Bucharest 72225, Romania
author
  • Institute of Microtechnology, P.O. Box 38-160, Bucharest 72225, Romania
author
  • Institute of Atomic Physics, P.O. Box MG-6, Bucharest 76900, Romania
author
  • METAV S.A., Zapada Mieilor 16-18, Bucharest 71529, Romania
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv91z529kz
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