Photoelectron Emission Microscopy and its Application to the Study of Polymer Surfaces

• Authors: A. Cossy-Favre , J. Diaz , S. Anders , H. Padmore , Y. Liu , M. Samant , J. Stöhr , H. Brown , T.P. Russell
• Languages of publication: EN

Abstracts

EN

The X-ray photoelectron emission microscopy at the Advanced Light Source has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 Å showed protrusions of 2-3 μm diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 Å thick films showed 5-6 μm segregated regions without any topological structure.

Keywords

EN

61.16.Ms; 73.61.Ph; 64.75.+g

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1997
• Volume: 91
• Issue: 5
• Pages: 923-927

Dates

published

1997-05

Contributors

author

A. Cossy-Favre

• Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA

author

J. Diaz

• Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA

author

S. Anders

• Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA

author

H. Padmore

• Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA

author

Y. Liu

• IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA

author

M. Samant

• IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA

author

J. Stöhr

• IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA

author

H. Brown

• IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA

author

T.P. Russell

• IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA