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1997 | 91 | 5 | 923-927
Article title

Photoelectron Emission Microscopy and its Application to the Study of Polymer Surfaces

Content
Title variants
Languages of publication
EN
Abstracts
EN
The X-ray photoelectron emission microscopy at the Advanced Light Source has a spatial resolution of 0.2 microns at an accelerating voltage of 12 kV. The tunability of the photon energy is used to provide chemical state information using near edge X-ray absorption fine structure spectroscopy on the sub-micrometer scale. The homogeneity of thin films of polymer blends was studied for various film thicknesses. The polystyrene/polyvinylmethylether film of 194 Å showed protrusions of 2-3 μm diameter with an enriched polystyrene content while the polystyrene/polystyreneacrylonitrile 504 Å thick films showed 5-6 μm segregated regions without any topological structure.
Keywords
EN
Publisher

Year
Volume
91
Issue
5
Pages
923-927
Physical description
Dates
published
1997-05
Contributors
  • Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA
author
  • Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA
author
  • Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA
author
  • Advanced Light Source, LBNL, 1, Cyclotron Road, Berkeley, CA 94720, USA
author
  • IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
author
  • IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
author
  • IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
author
  • IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
author
  • IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv91z515kz
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