Pulsed Laser Deposition of Amorphous Co-Fe-Ni-Si-B Thin Films

• Authors: R.R. Gareev , S.S. Alimpiev , Yu.V. Bugoslavskii , S.M. Nikiforov , A.I. Maslov , G Yu Shubnii , A.N. Zherichin
• Languages of publication: EN

Abstracts

EN

Soft magnetic multicomponent Co-Fe-Ni-Si-B thin films have been grown by pulsed laser deposition onto single-crystal sapphire and silicon substrates. The static hysteresis measurements for different substrate temperatures are presented. Thin films with a coercive force smaller than 1 Oe were grown at substrate temperatures from 250°C to 350°C. X-ray diffraction measurements proved that the structure of films is amorphous. The surface morphology of grown thin films was observed by scanning electron microscopy. The chemical composition of deposited films corresponds to the composition of bulk alloy.

Keywords

EN

75.50.Kj; 75.70.Ak

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1997
• Volume: 91
• Issue: 2
• Pages: 321-324

Dates

published

1997-02

Contributors

author

R.R. Gareev

• General Physics Institute, Russian Academy of Sciences, Vavilov St. 38, 117942 Moscow, Russia

author

S.S. Alimpiev

• General Physics Institute, Russian Academy of Sciences, Vavilov St. 38, 117942 Moscow, Russia

author

Yu.V. Bugoslavskii

• General Physics Institute, Russian Academy of Sciences, Vavilov St. 38, 117942 Moscow, Russia

author

S.M. Nikiforov

• General Physics Institute, Russian Academy of Sciences, Vavilov St. 38, 117942 Moscow, Russia

author

A.I. Maslov

• Scientific Research Institute for TV and Radio Broadcasting, Moscow, Russia

author

G Yu Shubnii

• Technological Lasers Center, Shatura, Moscow district, Russia

author

A.N. Zherichin

• Technological Lasers Center, Shatura, Moscow district, Russia