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1996 | 89 | 3 | 315-322
Article title

Scanning Force Microscopy Studies of Implanted Silicon Crystals

Content
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Languages of publication
EN
Abstracts
EN
Scanning force microscope has been applied to investigate wear tracks produced during friction coefficient measurements of hard steel ball against ⟨111⟩ silicon crystals implanted with Ar ions. Such treatment causes the stable and significant decrease in friction, despite the total removal of implanted species from the wear track during friction. Scanning force microscope measurements of wear tracks topography supported the former hypothesis assuming the formation of post-implantation dense microcracks structure and subsequent propagation of this structure into the bulk. Such process assures small size of wear particles and a low friction coefficient value. Additionally the microfriction force measurement method was applied to determine the friction coefficient of Si_{3}N_{4} cantilever and a wear track in Si crystal.
Keywords
EN
Publisher

Year
Volume
89
Issue
3
Pages
315-322
Physical description
Dates
published
1996-03
Contributors
author
  • Institute of Nuclear Physics, Radzikowskiego 152, 31-342 Kraków, Poland
author
  • Institute of Nuclear Physics, Radzikowskiego 152, 31-342 Kraków, Poland
author
  • Ecole Centrale Paris, Grande Voie des Vignes, 92295 Chatenay-Malabry Cedex, France
author
  • Institute of Nuclear Physics, Wilhelm-Klemm-Str. 9, 48-149 Münster, Germany
author
  • Institute of Nuclear Physics, Radzikowskiego 152, 31-342 Kraków, Poland
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv89z304kz
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