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1995 | 87 | 3 | 649-656
Article title

Extended X-ray Bremsstrahlung Isochromat Fine Structure of SiO_{2}

Content
Title variants
Languages of publication
EN
Abstracts
EN
X-ray bremsstrahlung isochromat of amorphous SiO_{2} deposited on Si crystal was measured in an energy range up to 250 eV above the threshold. Extended X-ray bremsstrahlung isochromat he structure (EXBIFS) was observed up to 150 eV for SiO_{2} studied. The Fourier transform of EXBIFS showed two peaks originated from first and second neighbors around silicon and oxygen ions. Model calculations of EXBIFS of amorphous SiO_{2} were performed in terms of single scattering of spherical waves and compared with experimental results.
Keywords
EN
Year
Volume
87
Issue
3
Pages
649-656
Physical description
Dates
published
1995-03
received
1994-08-01
(unknown)
1994-11-04
References
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv87z310kz
Identifiers
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