SEM Characterization of Multilayer Structures

• Authors: V. Aristov , N. Dryomova , V. Kireev , I. Razgonov , E. Yakimov
• Languages of publication: EN

Abstracts

EN

The possibilities of non-destructive multilayer structure characterization using the backscattering electron and modulated cathodoluminescence modes of the SEM have been discussed. It is shown that these techniques allow one to measure the parameters of thin layers of the thickness of about 10 nm.

Keywords

EN

79.20.Fv; 68.35.Dv

Discipline

• 79.20.Fv: Electron impact: Auger emission(for Auger electron spectroscopy, see 82.80.Pv)
• 68.35.Dv: Composition, segregation; defects and impurities

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1993
• Volume: 83
• Issue: 1
• Pages: 81-86

Dates

published

1993-01

received

1992-07-23

Contributors

author

V. Aristov

• Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 142432, Chernogolovka, Moscow district, Russia

author

N. Dryomova

• Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 142432, Chernogolovka, Moscow district, Russia

author

V. Kireev

• Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 142432, Chernogolovka, Moscow district, Russia

author

I. Razgonov

• Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 142432, Chernogolovka, Moscow district, Russia

author

E. Yakimov

• Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences, 142432, Chernogolovka, Moscow district, Russia

Identifiers

DOI

10.12693/APhysPolA.83.81