Diffusion of Potassium on Nickel

• Authors: M. Błaszczyszynowa , R. Błaszczyszyn
• Languages of publication: EN

Abstracts

EN

The surface diffusion of a potassium dose corresponding to the average coverage Θ̅_{K} = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migration with the energy Q < 0.16 eV is expected on the close-packed regions {111} and {001} already at liquid N_{2} temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer.

Keywords

EN

68.35.Fx; 79.70.+g; 79.90.+b

Discipline

• 79.90.+b: Other topics in electron and ion emission by liquids and solids and impact phenomena (restricted to new topics in section 79)
• 68.35.Fx: Diffusion; interface formation(see also 66.30.-h Diffusion in solids, for diffusion of adsorbates, see 68.43.Jk)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 1992
• Volume: 81
• Issue: 2
• Pages: 285-294

Dates

published

1992-02

received

1991-06-24

(unknown)

1991-09-09

Contributors

author

M. Błaszczyszynowa

• Institute of Experimental Physics, University of Wrocław, Cybulskiego 36, 50-205 Wrocław, Poland

author

R. Błaszczyszyn

• Institute of Experimental Physics, University of Wrocław, Cybulskiego 36, 50-205 Wrocław, Poland

Identifiers

DOI

10.12693/APhysPolA.81.285