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1992 | 81 | 2 | 285-294
Article title

Diffusion of Potassium on Nickel

Content
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Languages of publication
EN
Abstracts
EN
The surface diffusion of a potassium dose corresponding to the average coverage Θ̅_{K} = 1.5 on nickel was studied using the field emission technique in the temperature range of 78-133 K. In general, under such conditions diffusion proceeds with the sharp moving boundary and the activation energy Q from 0.16 eV to 0.36 eV dependently on the crystallographic directions. Free boundary migration with the energy Q < 0.16 eV is expected on the close-packed regions {111} and {001} already at liquid N_{2} temperature. The results are discussed in relation to the atomic structure of the nickel substrate taking into account the interaction in the adsorption layer.
Keywords
EN
Contributors
  • Institute of Experimental Physics, University of Wrocław, Cybulskiego 36, 50-205 Wrocław, Poland
  • Institute of Experimental Physics, University of Wrocław, Cybulskiego 36, 50-205 Wrocław, Poland
References
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv81z213kz
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