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Number of results
2017 | 132 | 2 | 357-360

Article title

Electronic Properties of Structures Containing Films of Alq₃ and LiBr Deposited on Si(111) Crystal

Content

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EN

Abstracts

EN
The electronic structures of Alq₃/Si(111) and Alq₃/LiBr/Si(111) interfaces are presented in this report. The studies were carried out in situ in ultrahigh vacuum by ultraviolet photoelectron spectroscopy. Alq₃ and LiBr layers were vapour deposited onto a single crystal of n-type Si(111). The energy level diagrams were prepared for the structures. The formation of the LiBr interfacial layer results in a decrease of the energy barrier at the interface.

Keywords

EN

Contributors

author
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
author
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
author
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
author
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland
author
  • Institute of Experimental Physics, University of Wrocław, pl. M. Borna 9, 50-204 Wrocław, Poland

References

  • [1] C.W. Tang, S.A. VanSlyke, Appl. Phys. Lett. 51, 913 (1987), doi: 10.1063/1.98799
  • [2] F. Schreiber, Phys. Status Solidi A Appl. Res. 201, 1037 (2004), doi: 10.1002/pssa.200404334
  • [3] K. Lament, W. Kamiński, P. Mazur, S. Zuber, A. Ciszewski, Appl. Surf. Sci. 304, 50 (2014), doi: 10.1016/j.apsusc.2014.02.101
  • [4] M.-M. Duvenhage, M. Ntwaeaborwa, H.G. Visser, P.J. Swarts, J.C. Swarts, H.C. Swart, Opt. Mater. 42, 193 (2015), doi: 10.1016/j.optmat.2015.01.008
  • [5] J. Lee, Y. Park, Appl. Phys. Lett. 82, 173 (2003), doi: 10.1063/1.1537048
  • [6] Y. Park, J. Lee, S.K. Lee, D.Y. Kim, Appl. Phys. Lett. 79, 105 (2001), doi: 10.1063/1.1383798
  • [7] J. Lee, Y. Park, S.K. Lee, E.-J. Cho, D.Y. Kim, H.Y. Chu, H. Lee, L.-M. Do, T. Zyung, Appl. Phys. Lett. 80, 3123 (2002), doi: 10.1063/1.1474602
  • [8] X. Zhou, J. He, L.S. Liao, M. Lu, Z.H. Xiong, X.M. Ding, X.Y. Hou, F.G. Tao, C.E. Zhou, S.T. Lee, Appl. Phys. Lett. 74, 609 (1999) , doi: 10.1063/1.123161

Document Type

Publication order reference

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YADDA identifier

bwmeta1.element.bwnjournal-article-appv132n2p39kz
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