Evaluation of Friction Coefficient and Adhesion Properties of Silicon Carbon Nitride Films Prepared by HWCVD

• Authors: T. Yamada , T. Iseda , Y. Kadotani , A. Izumi
• Languages of publication: EN

Abstracts

EN

We have investigated the friction-coefficient properties of silicon carbon nitride (SiCN) films deposited on stainless steel substrates and the adhesion properties of SiCN films deposited on Si(100). The SiCN films were deposited by hot-wire chemical vapor deposition using hexamethyldisilazane and ammonium. It was found that SiCN coating was able to effectively reduce the frictional coefficient of the stainless steel substrates. The adhesion strength was measured by surface-interface physical property analysis equipment (SAICAS) and was found to be 45 N/m for the as-deposited SiCN film on Si(100). Furthermore, a maximum adhesive strength of 92 N/m was obtained after treating the film for 10 min at 1000°C.

Keywords

EN

SiCN; HWCVD; friction-coefficient; adhesion strength

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2017
• Volume: 131
• Issue: 3
• Pages: 463-466

Dates

published

2017-03

Contributors

author

T. Yamada

• Kyushu Institute of Technology, 1-1 Sensui, Tobata, Kitakyushu, Fukuoka 804-8550, Japan
• Polytechnic College Fukuyama, 4-8-48 Kitahonjyou, Fukuyama, 720-0074, Japan

author

T. Iseda

• Kyushu Institute of Technology, 1-1 Sensui, Tobata, Kitakyushu, Fukuoka 804-8550, Japan

author

Y. Kadotani

• Top Macoat Co., Ltd. 6-31-1 Mizuki, Dazaifu, Fukuoka 818-0131, Japan

author

A. Izumi

• Kyushu Institute of Technology, 1-1 Sensui, Tobata, Kitakyushu, Fukuoka 804-8550, Japan
• Top Macoat Co., Ltd. 6-31-1 Mizuki, Dazaifu, Fukuoka 818-0131, Japan

References

• [1] J. Robertson, Mater. Sci. Eng. R. 37, 129 (2002), doi: 10.1016/S0927-796X(02)00005-0
• [2] Y. Oka, M. Kirinuki, Y. Nishimura, K. Azuma, E. Fujiwara, M. Yatsuzuka, Surf. Coat. Technol. 186, 141 (2004), doi: 10.1016/j.surfcoat.2004.04.010
• [3] L.F. Bonetti, G. Capote, L.V. Santos, E.J. Corat, V.J. Trava-Airoldi, Thin Solid Films 515, 375 (2006), doi: 10.1016/j.tsf.2005.12.154
• [4] J. Vetter, Surf. Coat. Tech. 257, 213 (2014), doi: 10.1016/j.surfcoat.2014.08.017
• [5] S. Yamazaki, Jpn. J. Appl. Phys. 9, 1467 (1970), doi: 10.1143/JJAP.9.1467
• [6] H. Wiesmann, A.K. Gosh, T. NcMahon, M. Strongin, J. Appl. Phys. 50, 3752 (1979), doi: 10.1063/1.326284
• [7] H. Matsumura, Jpn. J. Appl. Phys. 25, L949 (1986), doi: 10.1143/JJAP.25.L949
• [8] A. Izumi, K. Oda, Thin Solid Films 501, 195 (2006), doi: 10.1016/j.tsf.2005.07.210
• [9] S.G. Ansari, H. Umemoto, T. Morimoto, K. Yoneyama, A. Izumi, A. Masuda, H. Matsumura, Thin Solid Films 501, 31 (2006), doi: 10.1016/j.tsf.2005.07.098
• [10] F. Saito, I. Nishiyama, T. Hyodo, Mater. Lett. 63, 2257 (2009), doi: 10.1016/j.matlet.2009.07.037
• [11] N. Nagai, I. Nishiyama, Y. Kishima, K. Iida, K. Mori, Appl. Spectrosc. 67, 420 (2013), doi: 10.1366/12-06840

Identifiers

DOI

10.12693/APhysPolA.131.463