Structural and Electrical Properties of Electrodeposited Single Junction of Cuprous (I) Oxide-Copper

• Authors: E. Rówiński , M. Pławecki
• Languages of publication: EN

Abstracts

EN

Cuprous (I) oxide (Cu₂O)-based solar cells were fabricated with the use of the electrodeposition technique at nanometre-scale, and the structural, morphological and electrical properties were investigated. The Cu₂O layers were electrodeposited on crystalline and polycrystalline copper substrates. To complete the Cu₂O/Cu(100) and Cu₂O/Cu interfaces as the solar cells the top electrodes of silver paste were painted on the rear of Cu₂O. The microscopic analysis exhibits uneven surface morphologies of a Cu₂O film with the roughness of 92.5 nm, while the X-ray diffraction analysis reveals that the layers are Cu₂O-type polycrystalline structures with the thickness of 493 nm and the crystallite size of 69.8(6) nm. The theoretical analysis of the current-voltage curve was provided to determine the values of electrical parameters of the most efficient solar cell of Ag/Cu₂O/Cu(100) and clearly indicate presence of two Schottky barriers at interfaces.

Keywords

EN

61.05.cp; 73.50.Pz; 73.40.Sx

Discipline

• 61.05.cp: X-ray diffraction
• 73.40.Sx: Metal-semiconductor-metal structures
• 73.50.Pz: Photoconduction and photovoltaic effects

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2016
• Volume: 130
• Issue: 4
• Pages: 1141-1143

Dates

published

2016-10

Contributors

author

E. Rówiński

• Institute of Materials Science, University of Silesia, 75 Pułku Piechoty 1A, 41-500 Chorzów, Poland

author

M. Pławecki

• Institute of Materials Science, University of Silesia, 75 Pułku Piechoty 1A, 41-500 Chorzów, Poland

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Identifiers

DOI

10.12693/APhysPolA.130.1141