Microstructure Development in Multilayer TiB_x/TiSi_yC_z Coatings during Post-Deposition Heat Treatment

• Authors: A. Twardowska , B. Rajchel , J. Morgiel , M. Mędala-Wójcik
• Languages of publication: EN

Abstracts

EN

Multilayer amorphous TiB_{x}/TiSi_{y}C_{z} coatings were formed by duplex treatment: dual beam ion beam assisted deposition and pulsed laser deposition. Post-deposition heating was applied to activate crystallization in the coating. In situ transmission electron microscopy heating experiments were conducted in the temperature range 20-600°C. Crystallization of TiB₂ phase in TiB_{x} layers begun at 450°C, while TiSi_{y}C_{z} layers retained nearly amorphous up to 600°C.

Keywords

EN

81.15.Cd; 81.20.-n; 42.62.-b; 61.43.Dq; 68.37.-d; 68.37.Lp; 68.65.Ac; 64.70.Kb

Discipline

• 68.37.Lp: Transmission electron microscopy (TEM)
• 42.62.-b: Laser applications
• 81.20.-n: Methods of materials synthesis and materials processing(see also 61.72.U- Doping and impurity implantation; for crystal growth, see 81.10.-h; for film growth, deposition and epitaxy, see 81.15.-z)
• 68.37.-d: Microscopy of surfaces, interfaces, and thin films
• 68.65.Ac: Multilayers
• 81.15.Cd: Deposition by sputtering
• 61.43.Dq: Amorphous semiconductors, metals, and alloys

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2016
• Volume: 130
• Issue: 4
• Pages: 1124-1126

Dates

published

2016-10

Contributors

author

A. Twardowska

• Institute of Technology, Pedagogical University, Podchorazych 2, 30-084 Krakow, Poland

author

B. Rajchel

• The Henryk Niewodniczański Institute of Nuclear Physics, Polish Academy of Sciences, E. Radzikowskiego 152, 31-342 Krakow, Poland

author

J. Morgiel

• Institute of Metallurgy and Materials Science, Polish Academy of Sciences, W. Reymonta 25, 30-059 Krakow, Poland

author

M. Mędala-Wójcik

• Institute of Technology, Pedagogical University, Podchorazych 2, 30-084 Krakow, Poland

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Identifiers

DOI

10.12693/APhysPolA.130.1124