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Number of results
2016 | 130 | 1 | 385-387

Article title

Fabrication of Pyramid/Nanowire Binary Structure on n-Type Silicon Using Chemical Etching

Content

Title variants

Languages of publication

EN

Abstracts

EN
A pyramid and nanowire binary structure of n-type monocrystalline silicon surface was fabricated by two-step chemical etching process. The nanowire surface is formed by electroless etching in HF-AgNO₃ aqueous solution after being textured in KOH/IPA solution. Optical absorption was compared between this structure and that of random pyramid arrays. The effective reflectance calculated between 400 and 1100 nm decreased from ≈ 40% to ≈ 15% after pyramidal texturing and ≈ 4% after formation of vertically aligned nanowires with a length less than 1 μ m. This simple and low-cost surface structuring technique holds high potential for the manufacture of terrestrial silicon solar cells with reduced optical losses.

Keywords

EN

Year

Volume

130

Issue

1

Pages

385-387

Physical description

Dates

published
2016-07

Contributors

author
  • Centre de Recherche en Technologie des Semi-conducteurs pour l'Energétique (CRTSE), Division Technologies Emergentes des Semi-conducteurs pour l'Energétique (TESE), 2 Bd Frantz Fanon, B.P. 140, Alger-7 Merveilles, Algiers, Algeria
  • Faculté des Sciences et Technologie, Université de Khemis Miliana, route de Theniet El Had, 44225, Khemis Miliana, Algeria
author
  • Centre de Recherche en Technologie des Semi-conducteurs pour l'Energétique (CRTSE), Division Technologies Emergentes des Semi-conducteurs pour l'Energétique (TESE), 2 Bd Frantz Fanon, B.P. 140, Alger-7 Merveilles, Algiers, Algeria
author
  • Centre de Recherche en Technologie des Semi-conducteurs pour l'Energétique (CRTSE), Division Technologies Emergentes des Semi-conducteurs pour l'Energétique (TESE), 2 Bd Frantz Fanon, B.P. 140, Alger-7 Merveilles, Algiers, Algeria

References

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Document Type

Publication order reference

Identifiers

YADDA identifier

bwmeta1.element.bwnjournal-article-appv130n1103kz
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