Nanoscopic Investigation of Magnetic Thin Films by Means of Magnetic Force Microscopy Technique

• Authors: A. Sikora , M. Ozimek , W. Wilczyński
• Languages of publication: EN

Abstracts

EN

In the article the results of the research aimed at the recognition of the correlation between the Ni-Fe film thickness and its magnetic domain structures are described. Magnetic thin films were prepared by pulse magnetron sputtering. Obtained thin film thicknesses were in the range of 47.6-326.0 nm. Magnetic domain structures were imaged using magnetic force microscopy. In order to obtain quantitative description of magnetic domains images, the algorithms designed for topography parameters determination were applied, enabling the comparison of specific factors related to the magnetic properties of the samples. Utilized approach provided the analysis of the impact of sputtering parameters on the morphological and magnetic properties of obtained films.

Keywords

EN

81.15.Cd; 68.37.Rt; 75.70.Kw

Discipline

• 68.37.Rt: Magnetic force microscopy (MFM)
• 75.70.Kw: Domain structure (including magnetic bubbles and vortices)(for domain structure in ferroelectricity and antiferroelectricity, see 77.80.Dj)
• 81.15.Cd: Deposition by sputtering

• Journal: Acta Physica Polonica A
• Year: 2016
• Volume: 129
• Issue: 6
• Pages: 1226-1229

Dates

published

2016-06

received

2015-08-07

(unknown)

2016-02-29

Contributors

author

A. Sikora

• Electrotechnical Institute Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 55-369 Wrocław, Poland

author

M. Ozimek

• Electrotechnical Institute Division of Electrotechnology and Materials Science, M. Skłodowskiej-Curie 55/61, 55-369 Wrocław, Poland
• International Laboratory of High Magnetic Fields and Low Temperatures, Gajowicka 95, 52-421 Wrocław, Poland

author

W. Wilczyński

• Electrotechnical Institute, M. Pożaryskiego 28, 04-703 Warszawa, Poland

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Identifiers

DOI

10.12693/APhysPolA.129.1226