The Comparative Study of the Structure and Phase Composition of Ni-Based Coatings Modified by Plasma Jet or Electron Beam

• Authors: D. Alontseva , A. Russakova , A. Krasavin
• Languages of publication: EN

Abstracts

EN

The paper deals with the results of the comparative study into the structure and phase composition, as well as some properties (microhardness, corrosion resistance) of Ni-based powder coatings before and after their modification by DC electron beam or DC pulse plasma jet, according to the modes recommended on the basis of model calculations of the temperature profiles at irradiation. The transmission electron microscopy and X-ray analysis have revealed that irradiation leads to an increase in the volume fraction of reinforcing nanosized intermetallic components in the coatings. There were established certain similarities and differences in the structure and properties of the coatings modified by different types of irradiation. The microhardness of the irradiated coatings has increased in both cases along with the growth of the volume fraction of the CrNi₃ particle phase. However, it was found that the diffusion zone in the coatings modified by plasma jet is higher than that of the coatings modified by electron irradiation. The coating surface melted by the electron beam has a marked reduction of its roughness and better homogenization of the microstructure therefore demonstrating better adhesion and corrosion resistance.

Keywords

EN

81.15.-z; 81.07.-b; 68.47.Gh

Discipline

• 68.47.Gh: Oxide surfaces
• 81.07.-b: Nanoscale materials and structures: fabrication and characterization(for structure of nanoscale materials, see 61.46.-w; for nanostructured materials in electrochemistry, see 82.45.Yz; see also 62.23.-c Structural classes of nanoscale systems in mechanical properties of condensed matter)
• 81.15.-z: Methods of deposition of films and coatings; film growth and epitaxy(for structure of thin films, see 68.55.-a; see also 85.40.Sz Deposition technology in microelectronics; for epitaxial dielectric films, see 77.55.Px)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2016
• Volume: 129
• Issue: 4
• Pages: 838-841

Dates

published

2016-04

Contributors

author

D. Alontseva

• East-Kazakhstan State Technical University, 69 Protozanov St, Ust-Kamenogorsk, 070004, Kazakhstan

author

A. Russakova

• East-Kazakhstan State Technical University, 69 Protozanov St, Ust-Kamenogorsk, 070004, Kazakhstan

author

A. Krasavin

• East-Kazakhstan State Technical University, 69 Protozanov St, Ust-Kamenogorsk, 070004, Kazakhstan

References

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Identifiers

DOI

10.12693/APhysPolA.129.838