A Study on Discharge Characteristics by Using MF and RF Power in Remote Dielectric Barrier Discharge

• Authors: D. Kim , Y. Shim , H. Kim , J. Han
• Languages of publication: EN

Abstracts

EN

We have developed an atmospheric pressure plasma apparatus of remote dielectric barrier discharge (RDBD) applicable for a large area. We have systematically studied the characteristics of medium frequency (MF, 40 kHz) and radio frequency (RF, 13.56 MHz) discharge using an optical emission spectroscope. Nitrogen (N₂) and argon (Ar) gases were used in the MF and RF discharge excitation, respectively, in a mixture with clean dry air (CDA). The peak of oxygen radical (O*₂) appears at 259.3 nm when the RDBD is employed. Furthermore, intensive peaks are observed at gas ratios of N₂:CDA=100:1 in MF excitation and at gas ratios of Ar:CDA=70:0.5 in RF discharge excitation. On the other hand, the contact angle shows about 5° in PET samples after the RDBD treatment using the RF and MF discharge excitation. Surface analyses of polyethylene terephthalate (PET) samples were carried out using an atomic force microscope and X-ray photoelectron spectroscope.

Keywords

EN

52.77.Bn

Discipline

• 52.77.Bn: Etching and cleaning(see also 81.65.Cf Surface cleaning, etching, patterning in surface treatments)

• Journal: Acta Physica Polonica A
• Year: 2016
• Volume: 129
• Issue: 4
• Pages: 707-710

Dates

published

2016-04

Contributors

author

D. Kim

• Geniatech Inc., Room 810, Hanlla Sigma Valley, 545 Dunchun-daero, Jungwon-gu, Seongnam-si, Gyeonggi-do, South Korea
• CAPST, Sungkyunkwan University, 300 ChunChun-dong, Jangan-gu, Suwon 440-746, South Korea

author

Y. Shim

• Geniatech Inc., Room 810, Hanlla Sigma Valley, 545 Dunchun-daero, Jungwon-gu, Seongnam-si, Gyeonggi-do, South Korea

author

H. Kim

• KIST, Center for Spintronics, Hwarangno 14-gil 5, Seongbuk gu, Seoul 136-791, South Korea

author

J. Han

• CAPST, Sungkyunkwan University, 300 ChunChun-dong, Jangan-gu, Suwon 440-746, South Korea

References

• [1] R.A. Sailer, A. Wagner, Ch. Schmit, N. Klaverkamp, D.L. Schulz, Surf. Coat. Tech. 203, 835 (2008), doi: 10.1016/j.surfcoat.2008.06.053
• [2] Chang Heon Yi, Chang Hyun Jeong, Yong Hyuk Lee, Young Wook Ko, Geun Young Yeom, Surf. Coat. Tech. 177-178, 711 (2004), doi: 10.1016/j.surfcoat.2003.08.011
• [3] A. Pamreddy, D. Skácelová, M. Haničinec, P. Sťahel, M. Stupavská, M. Černák, J. Havel, Surf. Coat. Tech. 236, 326 (2013), doi: 10.1016/j.surfcoat.2013.10.008
• [4] K.D. Weltmann, E. Kindle, T. von Woedtke, M. Hahnel, M. Stieber, R. Brandenburg, Pure Appl. Chem. 82, 1223 (2010), doi: 10.1351/PAC-CON-09-10-35
• [5] H.-R. Lee, D.-J. Kim, K.-H. Lee, Surf. Coat. Tech. 142-144, 468 (2001), doi: 10.1016/S0257-8972(01)01137-9
• [6] D.-J. Kim, Y.-K. Kim, J.-G. Han, J. Kor. Inst. Surf. Eng. 44, 50 (2011), doi: 10.5695/JKISE.2011.44.2.050
• [7] Y.-K. Cho, D.-W. Park, H.-B. Kim, H.-R. Lim, H.-Y. Park, H.-J. Kim, D.-G. Jung, Appl. Surf. Sci. 296, 79 (2014), doi: 10.1016/j.apsusc.2014.01.048
• [8] Wei Chun Ma, Ching Yuan Tsai, Chung Huang, Surf. Coat. Tech. 259, 290 (2014), doi: 10.1016/j.surfcoat.2014.01.059
• [9] X. Lu, M. Laroussi, V. Puech, Plasma Sources Sci. Technol. 21, 034005 (2012), doi: 10.1088/0963-0252/21/3/034005
• [10] X. Lu, S. Wu, P.K. Chu, D. Liu, Y. Pan, Plasma Sources Sci. Technol. 20, 065009 (2011), doi: 10.1088/0963-0252/20/6/065009
• [11] X. Pei, X. Lu, J. Liu, D. Liu, Y. Yang, K. Ostrikov, P.K. Chu, Y. Pan, J. Phys. D: Appl. Phys. 45, 165205 (2012), doi: 10.1088/0022-3727/45/16/165205
• [12] ShuQun Wu, Zhan Wang, QuanJun Huang, XinPei Lu, Yuan Pan, IEEE T. Plasma Sci. 39, 1489 (2011), doi: 10.1109/TPS.2011.2132152
• [13] J.-Y. Kim, J. Ballato, S.-O. Kim, Plasma Processes Polym. 9, 253 (2012), doi: 10.1002/ppap.201100190
• [14] F. Massines, N. Gherardi, A. Fornelli, S. Martin, Surf. Coat. Tech. 200, 1855 (2005), doi: 10.1016/j.surfcoat.2005.08.010
• [15] M. Moravej, R.F. Hicks, Chem. Vap. Deposition 11, 469 (2005), doi: 10.1002/cvde.200400022
• [16] A. Grill, Cold Plasma Materials Fabrication: From Fundamentals to Applications, Wiley-IEEE, 1994, p. 28
• [17] R.W.B. Pearse, A.G. Gaydon, The Identification of Molecular Spectra, 4th ed., Chapman and Hall, 1984 reprinted, p. 258
• [18] M. Bou, J.M. Martin, Th. Le Mogne, L. Vovelle, Appl. Surf. Sci. 47, 149 (1991), doi: 10.1016/0169-4332(91)90029-J

Identifiers

DOI

10.12693/APhysPolA.129.707