Tailoring the Internal Evaporator for Effective Ion Beam Production - Volatile vs. Non-Volatile Substances

• Authors: M. Turek , A. Droździel , K. Pyszniak , S. Prucnal
• Languages of publication: EN

Abstracts

EN

Two different designs of the internal evaporator in an arc discharge ion source are presented, suitable either for volatile, or high-melting point substances. A matter of the evaporator size and placement in order to obtain its appropriate temperature and, therefore, a stable and intense ion beam, is considered. Basic ion source characteristics, i.e. the dependences of ion current and discharge voltage on the discharge and filament currents as well as on the external magnetic field flux density are shown and discussed in order to find optimal working conditions. The results of measurements for both volatile (P, Zn, Se, S) and non-volatile (Pd) are presented, showing the applicability of the design for ion implantation purposes.

Keywords

EN

07.77.Ka; 34.80.Dp; 61.72.uj

Discipline

• 61.72.uj: III-V and II-VI semiconductors
• 34.80.Dp: Atomic excitation and ionization
• 07.77.Ka: Charged-particle beam sources and detectors(see also 29.40.-n Radiation detectors in nuclear physics)

• Journal: Acta Physica Polonica A
• Year: 2015
• Volume: 128
• Issue: 5
• Pages: 939-942

Dates

published

2015-11

Contributors

author

M. Turek

• Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

author

A. Droździel

• Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

author

K. Pyszniak

• Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

author

S. Prucnal

• Institute of Physics, Maria Curie-Skłodowska University, pl. M. Curie-Skłodowskiej 1, 20-031 Lublin, Poland

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Identifiers

DOI

10.12693/APhysPolA.128.939