Dependence of ZnO Nanostructured Thin Films Properties on Growth Temperature by APCVD Method

• Authors: M. Maleki , S. Rozati
• Languages of publication: EN

Abstracts

EN

In this paper, the effect of substrate temperature on the electrical, structural, morphological and optical properties of nanostructured polycrystalline zinc oxide thin films were investigated by the Hall measurement, X-ray diffraction, scanning electron microscopy and UV-visible spectrophotometer, respectively. Then these modified thin films were deposited on two kinds of single crystal and polycrystalline of n- and p-type Si in three different substrate temperatures of 300, 400 and 500°C by low cost atmospheric pressure chemical vapor deposition method. Like the samples grown on the glass substrate, with increase of the temperature in samples grown on single crystal Si, preferred orientation changes from (100) to (002), while in samples deposited on poly crystalline Si, preferred orientation remains (100).

Keywords

EN

73.90.+f

Discipline

• 73.90.+f: Other topics in electronic structure and electrical properties of surfaces, interfaces, thin films, and low-dimensional structures (Restricted to new topics in section 73)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2015
• Volume: 128
• Issue: 3
• Pages: 367-372

Dates

published

2015-09

received

2015-01-09

(unknown)

2015-04-19

Contributors

author

M. Maleki

• Department of Physics, Faculty of Science, Fouman and Shaft Branch, Islamic Azad University, Fouman, Iran

author

S. Rozati

• CVD Lab., Physics Department, University of Guilan, Namjoo St., Faculty of Science, Rasht, Iran

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Identifiers

DOI

10.12693/APhysPolA.128.367