PL EN


Preferences help
enabled [disable] Abstract
Number of results
2015 | 128 | 3 | 326-330
Article title

Microstructure and Magnetic Properties of Magnetron-Sputtered [Fe/Pt]ₙ Multilayer Films

Authors
Content
Title variants
Languages of publication
EN
Abstracts
EN
[Fe/Pt]ₙ multilayer films were prepared on thermally oxidized Si (100) substrates at 300°C using dc magnetron sputtering and annealed for different temperature ranging from 350 to 500°C. It is found that the as-deposited [Fe/Pt]ₙ multilayer films exhibit well-resolved periodic structures and low roughness of interface. The ordering degree of the annealed films decreases and their perpendicular magnetic anisotropy deteriorates with increasing the period number. Fe/Pt bilayer film annealed at 350°C shows (001) orientation and hard magnetic characteristic, the coercivity and perpendicular anisotropy enhance with increase of annealing temperature. In addition, the hard and soft magnetic phases are not fully magnetically coupled in the Fe/Pt film annealed at higher temperature.
Keywords
EN
Year
Volume
128
Issue
3
Pages
326-330
Physical description
Dates
published
2015-09
received
2014-09-09
(unknown)
2015-06-17
Contributors
author
  • Key Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education, Jilin Normal University, Siping 136000, PR China
  • School of Materials Science and Engineering, Jilin University, Changchun 130025, PR China
author
  • School of Materials Science and Engineering, Jilin University, Changchun 130025, PR China
author
  • Key Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education, Jilin Normal University, Siping 136000, PR China
author
  • Key Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education, Jilin Normal University, Siping 136000, PR China
author
  • Key Laboratory of Functional Materials Physics and Chemistry of the Ministry of Education, Jilin Normal University, Siping 136000, PR China
  • State Key Laboratory of Inorganic Synthesis and Preparative Chemistry, Jilin University, Changchun 130012, PR China
References
  • [1] D. Weller, A. Moser, L. Folks, M.E. Best, W. Lee, M.F. Toney, M. Schwickert, J. Thiele, M.F. Doerner, IEEE Trans. Magn. 36, 10 (2000), doi: 10.1109/20.824418
  • [2] N. Kikuchi, S. Okamoto, O. Kitakami, J. Appl. Phys. 103, 07D511 (2008), doi: 10.1063/1.2830679
  • [3] Z.H. Lu, J.B. Guo, Z.H. Gan, Y. Liu, R. Xiong, G.J. Mankey, Appl. Phys. Lett. 113, 073912 (2013), doi: 10.1063/1.4791583
  • [4] I. Matsui, T. Ogi, F. Iskandar, K. Okuyama, J. Appl. Phys. 110, 083906 (2011), doi: 10.1063/1.3644925
  • [5] S.N. Hsiao, S.H. Liu, S.K. Chen, F.T. Yuan, H.Y. Lee, Appl. Phys. Lett. 111, 07A702 (2012), doi: 10.1063/1.3670515
  • [6] A. Martins, M.C.A. Fantini, N.M. Souza-Neto, A.Y. Ramos, A.D. Santos, J. Magn. Magn. Mater. 305, 152 (2006), doi: 10.1016/j.jmmm.2005.12.005
  • [7] Y.H. Fang, P.C. Kuo, S.C. Chen, S.L. Hsu, G.P. Lin, Thin Solid Films 517, 5185 (2009), doi: 10.1016/j.tsf.2009.03.141
  • [8] Y. Endo, K. Oikawa, T. Miyazaki, O. Kitakami, Y. Shimada, J. Appl. Phys. 94, 7222 (2003), doi: 10.1063/1.1622997
  • [9] B.M. Lairson, M.R. Visokay, R. Sinclair, B.M. Clemens, Appl. Phys. Lett. 62, 639 (1993), doi: 10.1063/1.108880
  • [10] Y. Ogata, Y. Imai, S. Nakagawa, J. Appl. Phys. 107, 09A715 (2010), doi: 10.1063/1.3337648
  • [11] P. Colombi, D.K. Agnihotri, V.E. Asadchikov, E. Bontempi, D.K. Bowen, C.H. Chang, L.E. Depero, M. Farnworth, T. Fujimoto, A. Gibaud, M. Jergel, M. Krumrey, T.A. Lafford, A. Lamperti, T. Ma, R.J. Matyi, M. Meduna, S. Milita, K. Sakurai, L. Shabel'nikov, A. Ulyanenkov, A. Van der Lee, C. Wiemer, J. Appl. Crystallogr. 41, 143 (2008), doi: 10.1107/S0021889807051904
  • [12] Q. Yang, L.R. Zhao, Mater. Charact. 59, 1285 (2008), doi: 10.1016/j.matchar.2007.11.001
  • [13] E.E. Fullerton, J.E. Mattson, S.R. Lee, C.H. Sowers, Y.Y. Huang, G. Felcher, S.D. Bader, J. Appl. Phys. 73, 6335 (1993), doi: 10.1063/1.352640
  • [14] S.C. Chen, T.H. Sun, Vacuum 84, 1430 (2010), doi: 10.1016/j.vacuum.2009.12.024
  • [15] S.C. Chen, T.H. Sun, C.L. Chang, C.L. Shen, P.C. Kuo, J.R. Chen, Thin Solid Films 519, 6964 (2011), doi: 10.1016/j.tsf.2011.01.210
  • [16] C.S. Kim, J.J. Sapan, S. Moyerman, K. Lee, E.E. Fullerton, M.H. Kryder, IEEE Trans. Magn. 46, 2282 (2010), doi: 10.1109/TMAG.2010.2045485
  • [17] F. Kurth, M. Weisheit, K. Leistner, T. Gemming, B. Holzapfel, L. Schultz, S. Fähler, Phys. Rev. B 82, 184404 (2010), doi: 10.1103/PhysRevB.82.184404
  • [18] H.L. Su, S.L. Tang, N.J. Tang, R.L. Wang, M. Lu, Y.W. Du, Nanotechnology 16, 2124 (2005), doi: 10.1088/0957-4484/16/10/025
  • [19] J.G. Na, J. Mater. Sci. Lett. 19, 1171 (2000), doi: 10.1023/A:1006767411684
  • [20] N. Zotov, J. Feydt, A. Ludwig, Thin Solid Films 517, 531 (2008), doi: 10.1016/j.tsf.2008.06.062
  • [21] Z.R. Dai, Z.L. Wang, S.H. Sun, Nano Lett. 1, 443 (2001), doi: 10.1021/nl0100421
  • [22] N. Honda, K. Ouchi, S. Iwasaki, IEEE Trans. Magn. 38, 1615 (2002), doi: 10.1109/TMAG.2002.1017744
Document Type
Publication order reference
Identifiers
YADDA identifier
bwmeta1.element.bwnjournal-article-appv128n316kz
JavaScript is turned off in your web browser. Turn it on to take full advantage of this site, then refresh the page.