X-Rays Response of Diamond Detectors Constructed Using Diamond Layers Produced by Low Power Microwave Chemical Vapor Deposition Reactor

• Authors: A. Kordyasz , A. Bednarek , M. Kowalczyk , J. Tarasiuk , E. Kulczycka , M. Teodorczyk , M. Gajewski , Ł. Kordyasz , O. Rowiński , K. Lamparski , Ł. Karwański , T. Lipczewski
• Languages of publication: EN

Abstracts

EN

The low power reactor for microwave chemical vapor deposition process is described. The rotating Mo holder of 12 mm diameter and 6 mm height with the diamond substrate was heated by 2.45 GHz microwaves to temperature about 800°C in the range of (1.5-7)% CH_{4}/H_{2} mixture to create plasma at pressure 70 Tr. Stabilization of the holder temperature was performed by optical observation of radiation from the holder followed by adjusting of the magnetron power. Diamond detectors are produced using microwave chemical vapor deposition process grown on single crystal diamond high pressure high temperature Sumimoto substrates, [100] oriented. The response of diamond detectors for X-rays has been measured in the current mode using medical X-rays tube. The linear response of the diamond detector current versus X-ray tube current (dose) is presented.

Keywords

EN

52.75.-d; 81.15.Gh; 29.40.Vj; 07.85.Fv

Discipline

• 81.15.Gh: Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, ALD, etc.)(for chemistry of MOCVD, see 82.33.Ya in physical chemistry and chemical physics)
• 29.40.Vj: Calorimeters
• 52.75.-d: Plasma devices(for ion sources, see 29.25.Lg, Ni; for plasma sources, see 52.50.Dg)
• 07.85.Fv: X- and γ-ray sources, mirrors, gratings, and detectors

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2015
• Volume: 127
• Issue: 5
• Pages: 1555-1559

Dates

published

2015-05

Contributors

author

A. Kordyasz

• Heavy Ion Laboratory, Warsaw University, L. Pasteura 5a, 02-093 Warsaw, Poland

author

A. Bednarek

• Heavy Ion Laboratory, Warsaw University, L. Pasteura 5a, 02-093 Warsaw, Poland

author

M. Kowalczyk

• Heavy Ion Laboratory, Warsaw University, L. Pasteura 5a, 02-093 Warsaw, Poland
• Institute of Experimental Physics, University of Warsaw, L. Pasteura 5a, 02-093 Warsaw, Poland

author

J. Tarasiuk

• Institute of Experimental Physics, University of Warsaw, L. Pasteura 5a, 02-093 Warsaw, Poland

author

E. Kulczycka

• National Centre for Nuclear Research, A. Sołtana 7, 05-400 Otwock, Poland

author

M. Teodorczyk

• Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warsaw, Poland

author

M. Gajewski

• Institute of Electronic Materials Technology, Wólczyńska 133, 01-919 Warsaw, Poland

author

Ł. Kordyasz

• Warsaw University of Technology, Faculty of Mechatronics, Institute of Micromechanics and Photonics, Department of Design of Precision Devices, Warsaw, Poland

author

O. Rowiński

• Medical University of Warsaw, S. Banacha 1, 02-097 Warsaw, Poland

author

K. Lamparski

• Medical University of Warsaw, S. Banacha 1, 02-097 Warsaw, Poland

author

Ł. Karwański

• Medical University of Warsaw, S. Banacha 1, 02-097 Warsaw, Poland

author

T. Lipczewski

• Medical University of Warsaw, S. Banacha 1, 02-097 Warsaw, Poland

References

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Identifiers

DOI

10.12693/APhysPolA.127.1555