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2015 | 127 | 4 | 901-903
Article title

Structure and Some Physical Properties of Chemically Deposited Nickel Sulfide Thin Films

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Abstracts
EN
Ni₂S_{2-x} thin films with x=0, 0.5, and 1 were prepared by chemical bath deposition technique. Amorphous structure was discovered by XRD for x=1, while α-Ni₇S₆ and NiS phases were discovered for x=0, and x=0.5 respectively. SEM graphs of the studied films have confirmed the XRD results. Optical band gap values increase from 0.845 to 0.912 eV, with increase of the composition x from 0 to 1. Activation energy values increase in the range from x=0 to x=0.5 and does not change for x=1.
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Contributors
author
  • Electron Microscope and Thin Films Department, Physics Division, National Research Centre,, Dokki, 12311, Cairo, Egypt
author
  • Electron Microscope and Thin Films Department, Physics Division, National Research Centre,, Dokki, 12311, Cairo, Egypt
author
  • Electron Microscope and Thin Films Department, Physics Division, National Research Centre,, Dokki, 12311, Cairo, Egypt
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bwmeta1.element.bwnjournal-article-appv127n4007kz
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