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2014 | 126 | 6 | 1331-1337
Article title

Influence of Thermal Process on Physical Properties of ZnO Films Prepared by Spray Pyrolysis

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EN
Abstracts
EN
ZnO films were deposited on glass substrates by ultrasonic spray pyrolysis technique at a substrate temperature of 300 ± 5°C. All of the films have been annealed at 500°C temperature for different time (1, 2, and 3 h) to improve the optical, electrical and surface properties. The effect of annealing time on the films of physical properties has been investigated. UV-Vis spectrophotometer has been used for transmittance measurements. Also, band gap values of the films have been determined by optical method. Atomic force microscopy has been used to have information the surface morphology and roughness values of the films. Thicknesses, refractive index and extinction coefficient values of the films have been determined by spectroscopic ellipsometry technique. The electrical conduction mechanisms and resistivity of the films were investigated using two probe technique. After all the investigations it was concluded that annealing time has a dramatic effect especially on the surface, optical properties and electrical resistivity values of ZnO films. From the results of these investigations, the application potential of the films for solar cell devices as transparent electrode was searched.
Keywords
Year
Volume
126
Issue
6
Pages
1331-1337
Physical description
Dates
published
2014-12
received
2014-01-06
(unknown)
2014-07-22
References
  • [1] R.G. Gordon, MRS Bull. 25, 52 (2000, doi: 10.1557/mrs2000.151
  • [2] T.H. Aeugle, H. Bialas, K. Heneka, W. Pleyer, Thin Solid Films 201, 293 (1991), doi: 10.1016/0040-6090(91)90118-H
  • [3] S. Matsuushima, D. Ikeda, K. Kobayashi, G. Okada, Chem. Lett. 2, 323 (1992), doi: 10.1246/cl.1992.323
  • [4] Y. Chen, D. Bagnall, T. Yao, Mater. Sci. Eng. B 75, 190, (2000), doi: 10.1016/S0921-5107(00)00372-X
  • [5] K.J. Chen, F.Y. Hung, S.J. Chang, S.J. Young, J. Alloys Comp. 479, 674 (2009), doi: 10.1016/j.jallcom.2009.01.026
  • [6] S.H. Lee, S.S. Lee, J.J. Choi, J.U. Jeon, K. Ro, Microsystem Technol. 11, 416 (2005), doi: 10.1007/s00542-004-0494-0
  • [7] J. Xua, Q. Pan, Y. Shun, Z. Tian, Sensors Actuat. B 66, 277, (2007), doi: 10.1016/S0925-4005(00)00381-6
  • [8] A. Romeo, D.L. Bätzner, H. Zogg, A.N. Tiwari, MRS Symp. Proc. 668, H3.3 (2001), doi: 10.1557/PROC-668-H3.3
  • [9] T.W. Hamann, A.B.F. Martinson, J.W. Elam, M.J. Pellin, J.T. Hupp, Adv. Mater. 20, 1560 (2008), doi: 10.1002/adma.200702781
  • [10] K. Haga, T. Suzuki, Y. Kashiwaba, H. Watanabe, B.P. Zhang, Y. Segawa, Thin Solid Films 433, 131 (2003), doi: 10.1016/S0040-6090(03)00327-4
  • [11] A. Martin, J.P. Espinos, A. Justo, J.P. Holgado, F. Yubero, A.R. Gonzatez-Elipe, Surf. Coat. Technol. 289, 151 (2002), doi: 10.1016/S0257-8972(01)01609-7
  • [12] H.F. Winters, P. Sigmund, J. Appl. Phys. 45, 4760 (1974), doi: 10.1063/1.1663131
  • [13] G. Fang, D. Li, B.-L. Yao, Vacuum 68, 363 (2003), doi: 10.1016/S0042-207X(02)00544-4
  • [14] J. San, T. Yang, G. Du, H. Liang, J. Bian, L. Hu, Appl. Surf. Sci. 253, 2066 (2006), doi: 10.1016/j.apsusc.2006.03.092
  • [15] E. Bacaksiz, M. Parlak, M. Tomakin, A. Ozcelik, M. Kiraz, M. Altunbas, J. Alloys Compd. 466, 447 (2008), doi: 10.1016/j.jallcom.2007.11.061
  • [16] M. Miki-Yoshida, F. Paraguay-Delgado, W. Estrada-Lopez, Thin Solid Films 376, 99 (2000), doi: 10.1016/S0040-6090(00)01408-5
  • [17] J.M. Bian, X.M. Li, X.D. Gao, W.D. Yu, L.D. Chen, Appl. Phys. Lett. 84, 541 (2004), doi: 10.1063/1.1644331
  • [18] J. Nolly, K.K. Abdullah, K.P. Vijayakumar, Phys. Lett., Spec. Issue 22, (2000), doi: 10.1002/pssa.2211010139
  • [19] F. Atay, S. Kose, V. Bilgin, I. Akyuz, Mater. Lett. 57, 3461 (2003), doi: 10.1016/S0167-577X(03)00100-9
  • [20] M. Khoshman Jebreel, E. Kordesch Martin, J. Non-Cryst. Solids 351, 3334 (2005), doi: 10.1016/j.jnoncrysol.2005.08.009
  • [21] F. Atay, I. Akyuz, S. Kose, E. Ketenci, V. Bilgin, J. Mater. Sci. Mater. Electron. 22, 492 (2011), doi: 10.1007/s10854-010-0166-z
  • [22] Y. Yang, X.W. Sun, B.J. Chen, C.X. Xu, T.P. Chen, C.Q. Sun, B.K. Tay, Z. Sun, Thin Solid Films 510, 95 (2006), doi: 10.1016/j.tsf.2005.12.265
  • [23] K. Nadarajah, C.Y. Chee, C.Y. Tan, J. Nanomater. 2013, ID 146382 (2013), doi: 10.1155/2013/146382
  • [24] E. Senadım, H. Kavak, R. Esen, J. Phys. Condens. Matter 18, 6391 (2006), doi: 10.1088/0953-8984/18/27/021
  • [25] S.Y. Ma, X.H. Yang, X.L. Huang, A.M. Sun, H.S. Song, H.B. Zhu, J. Alloys Comp. 566, 9 (2013), doi: 10.1016/j.jallcom.2013.02.179
  • [26] A. Mahmood, A. Nadeem, Q. Raza, Taj Muhammad Khan, M. Mehmood, M.M. Hassan, N. Mahmood, A. Mahmood, Phys. Scr. 82, 065801 (2010), doi: 10.1088/0031-8949/82/06/065801
  • [27] S.A. Aly, N.Z. El Sayed, M.A. Kaid, Vacuum 61, 1 (2001), doi: 10.1016/S0042-207X(00)00415-2
  • [28] M. Kruns, E. Mellikov, Thin Solid Films 270, 33 (1995), doi: 10.1016/0040-6090(95)06893-7
  • [29] S.W. Xuea , X.T. Zu , W.L. Zhou, H.X. Deng, X. Xiang, L. Zhang, H. Deng, J. Alloys Comp. 448, 21 (2008), doi: 10.1016/j.jallcom.2006.10.076
  • [30] V.R. Shinde, T.P. Gujar, C.D. Lokhande, R.S. Mane, S.H. Han, Mater. Chem. Phys. 96, 326 (2006), doi: 10.1016/j.matchemphys.2005.07.045
  • [31] L.C. Nehru, M. Umadevi, C. Sanjeeviraja, Int. J. Mater. Eng. 2, 12 (2012), doi: 10.5923/j.ijme.20120201.03
  • [32] S.Y. Chu, W. Water, J.T. Liaw, J. Europ. Ceram. Soc. 23, 1593 (2003), doi: 10.1016/S0955-2219(02)00404-1
  • [33] P. Nunes, E. Fortunato, R. Martins, Int. J. Inorg. Mater. 3, 1125 (2001), doi: 10.1016/S1466-6049(01)00113-1
  • [34] J.H. Lee, B.O. Park, Mater. Sci. Eng. B 106, 242 (2004), doi: 10.1016/j.mseb.2003.09.040
  • [35] T.Y. Ma, D.K. Shim, Thin Solid Films 410, 8 (2002), doi: 10.1016/S0040-6090(02)00072-X
  • [36] S. Major, A. Banerjee, K.L. Chopra, Thin Solid Films 122, 31 (1984), doi: 10.1016/0040-6090(84)90376-6
  • [37] Q.H. Li, Q. Wan, Y.X. Liang, T.H. Wang, Appl. Phys. Lett. 84, 4556 (2004), doi: 10.1063/1.1759071
  • [38] B.L. Zhu, D.W. Zeng, J. Wu, W.L. Song, C.S. Xie, J. Mater. Sci. Mater. Electron. 14, 521 (2003), doi: 10.1023/A:1023989304943
  • [39] B.L. Zhu, C.S. Xie, J. Wu, D.W. Zeng, A.H. Wang, X.Z. Zhao, Mater. Chem. Phys. 96, 459 (2006), doi: 10.1016/j.matchemphys.2005.07.044
Document Type
Publication order reference
YADDA identifier
bwmeta1.element.bwnjournal-article-appv126n622kz
Identifiers
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