Temperature Dependence of Ag Film Roughening during Deposition on Quasicrystal and Approximant Surfaces

• Authors: B. Ünal , J. Evans , P. Thiel
• Languages of publication: EN

Abstracts

EN

The temperature (T) dependence of roughening as assessed by scanning tunneling microscopy is compared for growth of Ag films on an 5-fold icosahedral Al-Pd-Mn quasicrystal surface and on an ξ'-approximant. Growth on the quasicrystal corresponds to a version of the Volmer-Weber growth, but modified by quantum size effects, and also by kinetic smoothening at low T and low coverages (θ). Growth on the approximant corresponds to a version of the Stranski-Krastanov growth modified by kinetic roughening at low T and low θ. For larger θ, i.e., for thicker films, distinct behavior is observed.

Keywords

EN

68.55.-a; 61.44.Br; 68.37.Ef; 81.15.Aa

Discipline

• 81.15.Aa: Theory and models of film growth
• 68.37.Ef: Scanning tunneling microscopy (including chemistry induced with STM)
• 61.44.Br: Quasicrystals
• 68.55.-a: Thin film structure and morphology(for methods of thin film deposition, film growth and epitaxy, see 81.15.-z)

• Publisher: Institute of Physics, Polish Academy of Sciences
• Journal: Acta Physica Polonica A
• Year: 2014
• Volume: 126
• Issue: 2
• Pages: 608-612

Dates

published

2014-08

Contributors

author

B. Ünal

• The Ames Laboratory, Iowa State University, Ames, Iowa 50011, USA
• Department of Materials Science and Engineering, Iowa State University, Ames, Iowa 50011, USA
• Department of Chemical Engineering, MIT, U.S.A.

author

J. Evans

• The Ames Laboratory, Iowa State University, Ames, Iowa 50011, USA
• Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011, USA

author

P. Thiel

• The Ames Laboratory, Iowa State University, Ames, Iowa 50011, USA
• Department of Materials Science and Engineering, Iowa State University, Ames, Iowa 50011, USA
• Department of Chemistry, Iowa State University, Ames, Iowa 50011, USA

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Identifiers

DOI

10.12693/APhysPolA.126.608